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Main Authors: Bikerouin, Mouad, Marzegalli, Anna, Spirito, Davide, Schaffar, Gerald J. K., Bongiorno, Corrado, Rovaris, Fabrizio, Zaghloul, Mohamed, Corley-Wiciak, Agnieszka Anna, Mio, Antonio M., Miglio, Leo, Maier-Kiener, Verena, Capellini, Giovanni, Scalise, Emilio
Format: Preprint
Published: 2024
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Online Access:https://arxiv.org/abs/2410.08372
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author Bikerouin, Mouad
Marzegalli, Anna
Spirito, Davide
Schaffar, Gerald J. K.
Bongiorno, Corrado
Rovaris, Fabrizio
Zaghloul, Mohamed
Corley-Wiciak, Agnieszka Anna
Mio, Antonio M.
Miglio, Leo
Maier-Kiener, Verena
Capellini, Giovanni
Scalise, Emilio
author_facet Bikerouin, Mouad
Marzegalli, Anna
Spirito, Davide
Schaffar, Gerald J. K.
Bongiorno, Corrado
Rovaris, Fabrizio
Zaghloul, Mohamed
Corley-Wiciak, Agnieszka Anna
Mio, Antonio M.
Miglio, Leo
Maier-Kiener, Verena
Capellini, Giovanni
Scalise, Emilio
contents We present a comprehensive study on the formation of micrometer-sized, textured hexagonal diamond silicon (hd-Si) crystals via nanoindentation followed by annealing. Utilizing advanced characterization techniques such as polarized Raman spectroscopy, high-resolution transmission electron microscopy, and electron energy-loss spectroscopy, we demonstrate the successful transformation of silicon into high-quality hd-Si. The experimental results are further supported by first-principles calculations and molecular dynamics simulations. Notably, the hd-Si phase consists of nanometer-sized grains with slight misorientations, organized into large micrometer-scale textured domains. These findings underscore the potential of nanoindentation as a precise and versatile tool for inducing pressure-driven phase transformations, particularly for the stabilization of hexagonal silicon. The textured nature of hd-Si also presents a unique opportunity to tailor its optical properties, opening new avenues for its application in semiconductor and optoelectronic devices.
format Preprint
id arxiv_https___arxiv_org_abs_2410_08372
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Formation of Micrometer-Sized Textured Hexagonal Silicon Crystals via Nanoindentation
Bikerouin, Mouad
Marzegalli, Anna
Spirito, Davide
Schaffar, Gerald J. K.
Bongiorno, Corrado
Rovaris, Fabrizio
Zaghloul, Mohamed
Corley-Wiciak, Agnieszka Anna
Mio, Antonio M.
Miglio, Leo
Maier-Kiener, Verena
Capellini, Giovanni
Scalise, Emilio
Materials Science
Applied Physics
We present a comprehensive study on the formation of micrometer-sized, textured hexagonal diamond silicon (hd-Si) crystals via nanoindentation followed by annealing. Utilizing advanced characterization techniques such as polarized Raman spectroscopy, high-resolution transmission electron microscopy, and electron energy-loss spectroscopy, we demonstrate the successful transformation of silicon into high-quality hd-Si. The experimental results are further supported by first-principles calculations and molecular dynamics simulations. Notably, the hd-Si phase consists of nanometer-sized grains with slight misorientations, organized into large micrometer-scale textured domains. These findings underscore the potential of nanoindentation as a precise and versatile tool for inducing pressure-driven phase transformations, particularly for the stabilization of hexagonal silicon. The textured nature of hd-Si also presents a unique opportunity to tailor its optical properties, opening new avenues for its application in semiconductor and optoelectronic devices.
title Formation of Micrometer-Sized Textured Hexagonal Silicon Crystals via Nanoindentation
topic Materials Science
Applied Physics
url https://arxiv.org/abs/2410.08372