Fabrication of functional 3D nanoarchitectures via atomic layer deposition on DNA origami crystals

Fuente: arXiv
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Auteurs principaux: Ermatov, Arthur, Kost, Melisande, Yin, Xin, Butler, Paul, Dass, Mihir, Sharp, Ian D., Liedl, Tim, Bein, Thomas, Posnjak, Gregor
Format: Preprint
Publié: 2024
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_version_ 1866913550894628864
author Ermatov, Arthur
Kost, Melisande
Yin, Xin
Butler, Paul
Dass, Mihir
Sharp, Ian D.
Liedl, Tim
Bein, Thomas
Posnjak, Gregor
author_facet Ermatov, Arthur
Kost, Melisande
Yin, Xin
Butler, Paul
Dass, Mihir
Sharp, Ian D.
Liedl, Tim
Bein, Thomas
Posnjak, Gregor
contents While DNA origami is a powerful bottom-up fabrication technique, the physical and chemical stability of DNA nanostructures is generally limited to aqueous buffer conditions. Wet chemical silicification can stabilise these structures but does not add further functionality. Here, we demonstrate a versatile 3D nanofabrication technique to conformally coat micrometre-sized DNA origami crystals with functional metal oxides via atomic layer deposition (ALD). In addition to depositing homogenous and conformal nanometre-thin ZnO, TiO2, and IrO2 (multi)layers inside SiO2-stablised crystals, we establish a method to directly coat bare DNA crystals with ALD layers while maintaining the crystal integrity, enabled by critical point drying and low ALD process temperatures. As a proof-of-concept application, we demonstrate electrocatalytic water oxidation using ALD IrO2-coated DNA origami crystals, resulting in improved performance relative to planar films. Overall, our coating strategy establishes a tool set for designing custom-made 3D nanomaterials with precisely defined topologies and material compositions, combining the unique advantages of DNA origami and atomically controlled deposition of functional inorganic materials.
format Preprint
id arxiv_https___arxiv_org_abs_2410_13393
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Fabrication of functional 3D nanoarchitectures via atomic layer deposition on DNA origami crystals
Ermatov, Arthur
Kost, Melisande
Yin, Xin
Butler, Paul
Dass, Mihir
Sharp, Ian D.
Liedl, Tim
Bein, Thomas
Posnjak, Gregor
Applied Physics
Materials Science
Biological Physics
While DNA origami is a powerful bottom-up fabrication technique, the physical and chemical stability of DNA nanostructures is generally limited to aqueous buffer conditions. Wet chemical silicification can stabilise these structures but does not add further functionality. Here, we demonstrate a versatile 3D nanofabrication technique to conformally coat micrometre-sized DNA origami crystals with functional metal oxides via atomic layer deposition (ALD). In addition to depositing homogenous and conformal nanometre-thin ZnO, TiO2, and IrO2 (multi)layers inside SiO2-stablised crystals, we establish a method to directly coat bare DNA crystals with ALD layers while maintaining the crystal integrity, enabled by critical point drying and low ALD process temperatures. As a proof-of-concept application, we demonstrate electrocatalytic water oxidation using ALD IrO2-coated DNA origami crystals, resulting in improved performance relative to planar films. Overall, our coating strategy establishes a tool set for designing custom-made 3D nanomaterials with precisely defined topologies and material compositions, combining the unique advantages of DNA origami and atomically controlled deposition of functional inorganic materials.
title Fabrication of functional 3D nanoarchitectures via atomic layer deposition on DNA origami crystals
topic Applied Physics
Materials Science
Biological Physics
url https://arxiv.org/abs/2410.13393