Imaging supermoiré relaxation in helical trilayer graphene

Fuente: arXiv
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Autori principali: Hoke, Jesse C., Li, Yifan, Hu, Yuwen, May-Mann, Julian, Watanabe, Kenji, Taniguchi, Takashi, Devakul, Trithep, Feldman, Benjamin E.
Natura: Preprint
Pubblicazione: 2024
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author Hoke, Jesse C.
Li, Yifan
Hu, Yuwen
May-Mann, Julian
Watanabe, Kenji
Taniguchi, Takashi
Devakul, Trithep
Feldman, Benjamin E.
author_facet Hoke, Jesse C.
Li, Yifan
Hu, Yuwen
May-Mann, Julian
Watanabe, Kenji
Taniguchi, Takashi
Devakul, Trithep
Feldman, Benjamin E.
contents In twisted van der Waals materials, local atomic relaxation can alter the underlying electronic structure. Characterizing lattice reconstruction and its susceptibility to strain is essential for understanding emergent electronic states, especially in multilayers in which interference between moiré lattices yields larger supermoiré patterns whose energy is highly sensitive to local stacking. Here we image spatial modulations in the electronic character of helical trilayer graphene, which indicate relaxation into a superstructure of large domains with uniform moiré periodicity. We show that the supermoiré domain size is increased by strain and can be altered in the same device while preserving the local properties within each domain. Finally, we observe a higher conductance at the domain boundaries, consistent with predictions that they host counter-propagating edge modes. Our work provides a real-space visualization of moiré-periodic domains, reveals two independently tunable length scales and demonstrates strain engineering as a route towards designing correlated topological networks at the supermoiré scale.
format Preprint
id arxiv_https___arxiv_org_abs_2410_16269
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Imaging supermoiré relaxation in helical trilayer graphene
Hoke, Jesse C.
Li, Yifan
Hu, Yuwen
May-Mann, Julian
Watanabe, Kenji
Taniguchi, Takashi
Devakul, Trithep
Feldman, Benjamin E.
Mesoscale and Nanoscale Physics
Strongly Correlated Electrons
In twisted van der Waals materials, local atomic relaxation can alter the underlying electronic structure. Characterizing lattice reconstruction and its susceptibility to strain is essential for understanding emergent electronic states, especially in multilayers in which interference between moiré lattices yields larger supermoiré patterns whose energy is highly sensitive to local stacking. Here we image spatial modulations in the electronic character of helical trilayer graphene, which indicate relaxation into a superstructure of large domains with uniform moiré periodicity. We show that the supermoiré domain size is increased by strain and can be altered in the same device while preserving the local properties within each domain. Finally, we observe a higher conductance at the domain boundaries, consistent with predictions that they host counter-propagating edge modes. Our work provides a real-space visualization of moiré-periodic domains, reveals two independently tunable length scales and demonstrates strain engineering as a route towards designing correlated topological networks at the supermoiré scale.
title Imaging supermoiré relaxation in helical trilayer graphene
topic Mesoscale and Nanoscale Physics
Strongly Correlated Electrons
url https://arxiv.org/abs/2410.16269