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Bibliographic Details
Main Authors: Imakire, K., Oiwa, A., Tokura, Y.
Format: Preprint
Published: 2024
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Online Access:https://arxiv.org/abs/2411.01148
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author Imakire, K.
Oiwa, A.
Tokura, Y.
author_facet Imakire, K.
Oiwa, A.
Tokura, Y.
contents For photon-spin conversion, the Ge hole system in a strained GeSi/Ge quantum well with a diamond structure has attracted significant attention because of the potential for a high-performance spin qubit and optical transitions ranging in telecom bands. We calculated the electron g-factor for strained Ge, analyzing its dependence on both the growth directions ([100], [110], and [111]) and the Ge content of the SiGe substrate using an 8-band model. Our results indicate that the absolute values of the electron g-factor decrease with decreasing Ge content, ranging from approximately -3.0 to -1.4 for all growth directions.
format Preprint
id arxiv_https___arxiv_org_abs_2411_01148
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Electron g-factor of strained Ge caused by the SiGe substrate and its dependence on growth directions
Imakire, K.
Oiwa, A.
Tokura, Y.
Mesoscale and Nanoscale Physics
Materials Science
Quantum Physics
For photon-spin conversion, the Ge hole system in a strained GeSi/Ge quantum well with a diamond structure has attracted significant attention because of the potential for a high-performance spin qubit and optical transitions ranging in telecom bands. We calculated the electron g-factor for strained Ge, analyzing its dependence on both the growth directions ([100], [110], and [111]) and the Ge content of the SiGe substrate using an 8-band model. Our results indicate that the absolute values of the electron g-factor decrease with decreasing Ge content, ranging from approximately -3.0 to -1.4 for all growth directions.
title Electron g-factor of strained Ge caused by the SiGe substrate and its dependence on growth directions
topic Mesoscale and Nanoscale Physics
Materials Science
Quantum Physics
url https://arxiv.org/abs/2411.01148