Reproducible Monolayer MoS2 Devices Free of Resist Contamination by Gold Mask Lithography

Fuente: arXiv

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Bibliographic Details
Main Authors:	Liu, Yumeng, Wang, Yizhuo, Fan, Zhengfang, Wei, Jianyong, Guo, Shuwen, Su, Zhijuan, Dan, Yaping
Format:	Preprint
Published:	2024
Subjects:	Materials Science Mesoscale and Nanoscale Physics
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2411.02205