Weak antilocalization in the transition metal telluride Ta$_2$Pd$_3$Te$_5$

Fuente: arXiv
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Autores principales: Jiao, Wen-He, Qiu, Hang-Qiang, Yang, Wuzhang, Bao, Jin-Ke, Xiao, Shaozhu, Liu, Yi, Li, Yuke, Cao, Guang-Han, Xu, Xiaofeng, Ren, Zhi, Zhang, Peng
Formato: Preprint
Publicado: 2024
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author Jiao, Wen-He
Qiu, Hang-Qiang
Yang, Wuzhang
Bao, Jin-Ke
Xiao, Shaozhu
Liu, Yi
Li, Yuke
Cao, Guang-Han
Xu, Xiaofeng
Ren, Zhi
Zhang, Peng
author_facet Jiao, Wen-He
Qiu, Hang-Qiang
Yang, Wuzhang
Bao, Jin-Ke
Xiao, Shaozhu
Liu, Yi
Li, Yuke
Cao, Guang-Han
Xu, Xiaofeng
Ren, Zhi
Zhang, Peng
contents We report transport studies on the layered van der Waals topological crystalline insulator Ta$_2$Pd$_3$Te$_5$. The temperature-dependent resistance at high temperature is dominated by a bulk insulating gap and tend to saturate at low temperatures. Low temperature magnetotransport shows that Ta$_2$Pd$_3$Te$_5$ exhibits weak antilocatization (WAL) effect in both perpendicular orientation and parallel orientation, suggesting an contribution of the WAL effect from both topological edge states and bulk states. By measuring the anisotropic magnetoconductance and then subtracting the contribution of bulk states, the WAL effect associated with topological edge states can be revealed and analyzed quantitatively based on the two-dimensional Hikami-Larkin-Nagaoka model. Our results have important implications in understanding the WAL phenomena in Ta$_2$Pd$_3$Te$_5$.
format Preprint
id arxiv_https___arxiv_org_abs_2411_04375
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Weak antilocalization in the transition metal telluride Ta$_2$Pd$_3$Te$_5$
Jiao, Wen-He
Qiu, Hang-Qiang
Yang, Wuzhang
Bao, Jin-Ke
Xiao, Shaozhu
Liu, Yi
Li, Yuke
Cao, Guang-Han
Xu, Xiaofeng
Ren, Zhi
Zhang, Peng
Materials Science
We report transport studies on the layered van der Waals topological crystalline insulator Ta$_2$Pd$_3$Te$_5$. The temperature-dependent resistance at high temperature is dominated by a bulk insulating gap and tend to saturate at low temperatures. Low temperature magnetotransport shows that Ta$_2$Pd$_3$Te$_5$ exhibits weak antilocatization (WAL) effect in both perpendicular orientation and parallel orientation, suggesting an contribution of the WAL effect from both topological edge states and bulk states. By measuring the anisotropic magnetoconductance and then subtracting the contribution of bulk states, the WAL effect associated with topological edge states can be revealed and analyzed quantitatively based on the two-dimensional Hikami-Larkin-Nagaoka model. Our results have important implications in understanding the WAL phenomena in Ta$_2$Pd$_3$Te$_5$.
title Weak antilocalization in the transition metal telluride Ta$_2$Pd$_3$Te$_5$
topic Materials Science
url https://arxiv.org/abs/2411.04375