Electron dynamics and SiO2 etching profile evolution in capacitive Ar/CHF3 discharges driven by sawtooth-tailored voltage waveforms

Fuente: arXiv

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Bibliographic Details
Main Authors:	Dong, Wan, Song, Liu-Qin, Zhang, Yi-Fan, Wang, Li, Song, Yuan-Hong, Schulze, Julian
Format:	Preprint
Published:	2024
Subjects:	Plasma Physics
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2411.07839