Tailoring Transverse Magneto-Optical Kerr Effect Enhancement in Mie-resonant Nanowire-based Metasurfaces
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arXiv
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| Main Authors: | , , , |
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| Format: | Preprint |
| Published: |
2024
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| _version_ | 1866929728439451648 |
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| author | Mamian, Karen A. Popov, Vladimir V. Frolov, Aleksandr Yu. Fedyanin, Andrey A. |
| author_facet | Mamian, Karen A. Popov, Vladimir V. Frolov, Aleksandr Yu. Fedyanin, Andrey A. |
| contents | Enhancement and tailoring of the transverse magneto-optical Kerr effect (TMOKE) in hybrid metasurfaces comprising rectangular silicon nanowires coupled with a nickel substrate are demonstrated. The excitation of Mie modes of different orders in nanowires causes the enhancement. The in-plane magnetic dipole mode leads to the largest TMOKE enhancement compared to other Mie modes. Changing the width of silicon nanowires leads to a modification of that mode, thereby ensuring the tailoring of the TMOKE within the range of $2.2\% - 3.8\%$. This tunability is associated with the modification of the near-field localized at the Si/Ni interface and the far-field response of the excited magnetic dipole mode. Adjusting these two quantities allows one to achieve the highest values of the TMOKE caused by individual Mie modes in silicon nanowires. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2411_08385 |
| institution | arXiv |
| publishDate | 2024 |
| record_format | arxiv |
| spellingShingle | Tailoring Transverse Magneto-Optical Kerr Effect Enhancement in Mie-resonant Nanowire-based Metasurfaces Mamian, Karen A. Popov, Vladimir V. Frolov, Aleksandr Yu. Fedyanin, Andrey A. Optics Enhancement and tailoring of the transverse magneto-optical Kerr effect (TMOKE) in hybrid metasurfaces comprising rectangular silicon nanowires coupled with a nickel substrate are demonstrated. The excitation of Mie modes of different orders in nanowires causes the enhancement. The in-plane magnetic dipole mode leads to the largest TMOKE enhancement compared to other Mie modes. Changing the width of silicon nanowires leads to a modification of that mode, thereby ensuring the tailoring of the TMOKE within the range of $2.2\% - 3.8\%$. This tunability is associated with the modification of the near-field localized at the Si/Ni interface and the far-field response of the excited magnetic dipole mode. Adjusting these two quantities allows one to achieve the highest values of the TMOKE caused by individual Mie modes in silicon nanowires. |
| title | Tailoring Transverse Magneto-Optical Kerr Effect Enhancement in Mie-resonant Nanowire-based Metasurfaces |
| topic | Optics |
| url | https://arxiv.org/abs/2411.08385 |