Solvated Electrons and Hydroxyl Radicals at the Plasma-Liquid Interface
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| Main Authors: | , , , |
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| Format: | Preprint |
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2024
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| _version_ | 1866917838845902848 |
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| author | Lee, Seungjun Kang, Hyung-Gu Kim, Minkwan Yun, Gunsu |
| author_facet | Lee, Seungjun Kang, Hyung-Gu Kim, Minkwan Yun, Gunsu |
| contents | While hydroxyl radicals ($\cdot$OH) play an important role as potent oxidizing agents in various plasma applications, their high reactivity confines them to a thin layer at the plasma-liquid interface, posing challenges in comprehending the intricate generation and transport processes. Similarly, solvated electrons ($\mathrm{e_{aq}}$), highly reactive reducing agents, are expected to exhibit distribution beneath the liquid surface and interact with $\cdot$OH in the thin layer. In this study, we have determined the penetration depth and concentration of ($\mathrm{e_{aq}}$) at the interface between an atmospheric argon plasma plume and an electrolyte anode via a lock-in amplification absorbance measurement. With bias voltages from 1000 to 2500 V, the penetration depth remains approximately 10 nm, and the peak concentration near the surface reaches 1 mM. Diffusion is the primary mechanism for $\cdot$OH generation in the electrolyte, with most $\cdot$OH reacting with ($\mathrm{e_{aq}}$) at the interface, thus influencing the ($\mathrm{e_{aq}}$) distribution. In contrast, the electrolyte cathode significantly boosts $\cdot$OH generation, leading to rapid recombination into hydrogen peroxide. |
| format | Preprint |
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arxiv_https___arxiv_org_abs_2411_09991 |
| institution | arXiv |
| publishDate | 2024 |
| record_format | arxiv |
| spellingShingle | Solvated Electrons and Hydroxyl Radicals at the Plasma-Liquid Interface Lee, Seungjun Kang, Hyung-Gu Kim, Minkwan Yun, Gunsu Plasma Physics Applied Physics While hydroxyl radicals ($\cdot$OH) play an important role as potent oxidizing agents in various plasma applications, their high reactivity confines them to a thin layer at the plasma-liquid interface, posing challenges in comprehending the intricate generation and transport processes. Similarly, solvated electrons ($\mathrm{e_{aq}}$), highly reactive reducing agents, are expected to exhibit distribution beneath the liquid surface and interact with $\cdot$OH in the thin layer. In this study, we have determined the penetration depth and concentration of ($\mathrm{e_{aq}}$) at the interface between an atmospheric argon plasma plume and an electrolyte anode via a lock-in amplification absorbance measurement. With bias voltages from 1000 to 2500 V, the penetration depth remains approximately 10 nm, and the peak concentration near the surface reaches 1 mM. Diffusion is the primary mechanism for $\cdot$OH generation in the electrolyte, with most $\cdot$OH reacting with ($\mathrm{e_{aq}}$) at the interface, thus influencing the ($\mathrm{e_{aq}}$) distribution. In contrast, the electrolyte cathode significantly boosts $\cdot$OH generation, leading to rapid recombination into hydrogen peroxide. |
| title | Solvated Electrons and Hydroxyl Radicals at the Plasma-Liquid Interface |
| topic | Plasma Physics Applied Physics |
| url | https://arxiv.org/abs/2411.09991 |