Copertina

Dissociative photoionization of EUV lithography photoresist models

Fuente: arXiv

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Dettagli Bibliografici
Autori principali:	Gentile, Marziogiuseppe, Gerlach, Marius, Richter, Robert, van Setten, Michiel J., Petersen, John S., van der Heide, Paul, Holzmeier, Fabian
Natura:	Preprint
Pubblicazione:	2024
Soggetti:	Materials Science Chemical Physics
Accesso online:	Acceder al recurso
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