Effects of Photopatterning Conditions on Azimuthal Surface Anchoring Strength

Fuente: arXiv
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Main Authors: Haputhanthrige, Nilanthi P., Rajabi, Mojtaba, Lavrentovich, Oleg D.
Format: Preprint
Published: 2024
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_version_ 1866915052489015296
author Haputhanthrige, Nilanthi P.
Rajabi, Mojtaba
Lavrentovich, Oleg D.
author_facet Haputhanthrige, Nilanthi P.
Rajabi, Mojtaba
Lavrentovich, Oleg D.
contents Spatially varying alignment of liquid crystals is essential for research and applications. One widely used method is based on the photopatterning of thin layers of azo-dye molecules, such as Brilliant Yellow (BY), that serve as an aligning substrate for a liquid crystal. In this study, we examine how photopatterning conditions, such as BY layer thickness (b), light intensity (I), irradiation dose, and age affect the alignment quality and the strength of the azimuthal surface anchoring. The azimuthal surface anchoring coefficient, W, is determined by analyzing the splitting of integer disclinations into half-integer disclinations at pre patterned substrates. The strongest anchoring is achieved for b in the range of 5-8 nm. W increases with the dose, and within the same dose, W increases with I. Aging of a non-irradiated BY coating above 15 days reduces W. Our study also demonstrates that sealed photopatterned cells filled with a conventional nematic preserve their alignment quality for up to four weeks, after which time W decreases. This work suggests the optimization pathways for photoalignment of nematic liquid crystals.
format Preprint
id arxiv_https___arxiv_org_abs_2411_13835
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Effects of Photopatterning Conditions on Azimuthal Surface Anchoring Strength
Haputhanthrige, Nilanthi P.
Rajabi, Mojtaba
Lavrentovich, Oleg D.
Soft Condensed Matter
Spatially varying alignment of liquid crystals is essential for research and applications. One widely used method is based on the photopatterning of thin layers of azo-dye molecules, such as Brilliant Yellow (BY), that serve as an aligning substrate for a liquid crystal. In this study, we examine how photopatterning conditions, such as BY layer thickness (b), light intensity (I), irradiation dose, and age affect the alignment quality and the strength of the azimuthal surface anchoring. The azimuthal surface anchoring coefficient, W, is determined by analyzing the splitting of integer disclinations into half-integer disclinations at pre patterned substrates. The strongest anchoring is achieved for b in the range of 5-8 nm. W increases with the dose, and within the same dose, W increases with I. Aging of a non-irradiated BY coating above 15 days reduces W. Our study also demonstrates that sealed photopatterned cells filled with a conventional nematic preserve their alignment quality for up to four weeks, after which time W decreases. This work suggests the optimization pathways for photoalignment of nematic liquid crystals.
title Effects of Photopatterning Conditions on Azimuthal Surface Anchoring Strength
topic Soft Condensed Matter
url https://arxiv.org/abs/2411.13835