Full 3D Model of Modulation Efficiency of Complementary Metal Oxide Semiconductor (CMOS) Compatible, Submicron, Interleaved Junction Optical Phase Shifters

Fuente: arXiv
Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Shaikh, Abdurrahman Javid, Packeer, Fauzi, Baig, Mirza Muhammad Ali, Sidek, Othman
Format: Preprint
Veröffentlicht: 2024
Schlagworte:
Online-Zugang:
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
_version_ 1866913593925042176
author Shaikh, Abdurrahman Javid
Packeer, Fauzi
Baig, Mirza Muhammad Ali
Sidek, Othman
author_facet Shaikh, Abdurrahman Javid
Packeer, Fauzi
Baig, Mirza Muhammad Ali
Sidek, Othman
contents Performance optimization associated with optical modulators requires reasonably accurate predictive models for key figures of merit. Interleaved PN-junction topology offers the maximum mode/junction overlap and is the most efficient modulator in depletion-mode of operation. Due to its structure, the accurate modelling process must be fully three-dimensional, which is a nontrivial computational problem. This paper presents a rigorous 3D model for the modulation efficiency of silicon-on-insulator interleaved junction optical phase modulators with submicron dimensions. Solution of Drift-Diffusion and Poisson equations were carried out on 3D finite-element-mesh and Maxwell equations were solved using Finite-Difference-Time-Domain (FDTD) method on 3D Yee-cells. Whole of the modelling process has been detailed and all the coefficients required in the model are presented. Model validation suggests < 10% RMS error.
format Preprint
id arxiv_https___arxiv_org_abs_2412_01305
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Full 3D Model of Modulation Efficiency of Complementary Metal Oxide Semiconductor (CMOS) Compatible, Submicron, Interleaved Junction Optical Phase Shifters
Shaikh, Abdurrahman Javid
Packeer, Fauzi
Baig, Mirza Muhammad Ali
Sidek, Othman
Optics
Signal Processing
Applied Physics
Performance optimization associated with optical modulators requires reasonably accurate predictive models for key figures of merit. Interleaved PN-junction topology offers the maximum mode/junction overlap and is the most efficient modulator in depletion-mode of operation. Due to its structure, the accurate modelling process must be fully three-dimensional, which is a nontrivial computational problem. This paper presents a rigorous 3D model for the modulation efficiency of silicon-on-insulator interleaved junction optical phase modulators with submicron dimensions. Solution of Drift-Diffusion and Poisson equations were carried out on 3D finite-element-mesh and Maxwell equations were solved using Finite-Difference-Time-Domain (FDTD) method on 3D Yee-cells. Whole of the modelling process has been detailed and all the coefficients required in the model are presented. Model validation suggests < 10% RMS error.
title Full 3D Model of Modulation Efficiency of Complementary Metal Oxide Semiconductor (CMOS) Compatible, Submicron, Interleaved Junction Optical Phase Shifters
topic Optics
Signal Processing
Applied Physics
url https://arxiv.org/abs/2412.01305