A Light-Emitting-Diodes-Integrated Silicon Carbide Insulated Gate Bipolar Transistor

Fuente: arXiv
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Autores principales: Zhang, Guoliang, Shen, Zhanwei, Chen, Yujian, Qiu, Yufeng, Zhang, Feng, Zhang, Rong
Formato: Preprint
Publicado: 2024
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author Zhang, Guoliang
Shen, Zhanwei
Chen, Yujian
Qiu, Yufeng
Zhang, Feng
Zhang, Rong
author_facet Zhang, Guoliang
Shen, Zhanwei
Chen, Yujian
Qiu, Yufeng
Zhang, Feng
Zhang, Rong
contents A light-emitting-diodes (LEDs)-integrated silicon carbide (SiC) insulated gate bipolar transistors (LI-IGBT) is proposed in this paper. The novelty of the LI-IGBT depends on the photogeneration effect of III-nitride LEDs embedded in the poly-Si regions of IGBT. Then, the photogenerated carriers are formed in the JFET region and the drift layer, indicating the increase of the conductivity in LI-IGBT as compared with the SiC IGBT with hole-barrier layer (H-IGBT) and the SiC IGBT with charge storage layer (CSL-IGBT). The static simulation results show that the electron density of the LI-IGBT at the middle of the drift layer is separately 17.44 times and 15.81 times higher than those of the H-IGBT and CSL-IGBT, yielding 40.91% and 37.38% reduction of forward voltage drop, respectively, and also, the LI-IGBT shows 304.59% and 263.67% improvements in BFOM as compared with CSL-IGBT and H-IGBT, respectively. For the dynamic simulation in one cycle, the loss of LI-IGBT is separately reduced by 6.57% and 8.57% compared to H-IGBT and CSL-IGBT. Meanwhile, the relationship between VC(sat) and Eturn-off can be optimized by adjusting collector doping and minority carrier lifetime. These results reveal that the proposed SiC IGBT will be more suitable for ultra-high voltage application.
format Preprint
id arxiv_https___arxiv_org_abs_2412_01665
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle A Light-Emitting-Diodes-Integrated Silicon Carbide Insulated Gate Bipolar Transistor
Zhang, Guoliang
Shen, Zhanwei
Chen, Yujian
Qiu, Yufeng
Zhang, Feng
Zhang, Rong
Applied Physics
Optics
A light-emitting-diodes (LEDs)-integrated silicon carbide (SiC) insulated gate bipolar transistors (LI-IGBT) is proposed in this paper. The novelty of the LI-IGBT depends on the photogeneration effect of III-nitride LEDs embedded in the poly-Si regions of IGBT. Then, the photogenerated carriers are formed in the JFET region and the drift layer, indicating the increase of the conductivity in LI-IGBT as compared with the SiC IGBT with hole-barrier layer (H-IGBT) and the SiC IGBT with charge storage layer (CSL-IGBT). The static simulation results show that the electron density of the LI-IGBT at the middle of the drift layer is separately 17.44 times and 15.81 times higher than those of the H-IGBT and CSL-IGBT, yielding 40.91% and 37.38% reduction of forward voltage drop, respectively, and also, the LI-IGBT shows 304.59% and 263.67% improvements in BFOM as compared with CSL-IGBT and H-IGBT, respectively. For the dynamic simulation in one cycle, the loss of LI-IGBT is separately reduced by 6.57% and 8.57% compared to H-IGBT and CSL-IGBT. Meanwhile, the relationship between VC(sat) and Eturn-off can be optimized by adjusting collector doping and minority carrier lifetime. These results reveal that the proposed SiC IGBT will be more suitable for ultra-high voltage application.
title A Light-Emitting-Diodes-Integrated Silicon Carbide Insulated Gate Bipolar Transistor
topic Applied Physics
Optics
url https://arxiv.org/abs/2412.01665