Large Bidirectional Refractive Index Change in Silicon-rich Nitride via Visible Light Trimming

Fuente: arXiv
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Main Authors: Belogolovskii, Dmitrii, Rahman, Md Masudur, Johnson, Karl, Fedorov, Vladimir, Grieco, Andrew, Alic, Nikola, Ndao, Abdoulaye, Yu, Paul K. L., Fainman, Yeshaiahu
Format: Preprint
Published: 2024
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author Belogolovskii, Dmitrii
Rahman, Md Masudur
Johnson, Karl
Fedorov, Vladimir
Grieco, Andrew
Alic, Nikola
Ndao, Abdoulaye
Yu, Paul K. L.
Fainman, Yeshaiahu
author_facet Belogolovskii, Dmitrii
Rahman, Md Masudur
Johnson, Karl
Fedorov, Vladimir
Grieco, Andrew
Alic, Nikola
Ndao, Abdoulaye
Yu, Paul K. L.
Fainman, Yeshaiahu
contents Phase-sensitive integrated photonic devices are highly susceptible to minor manufacturing deviations, resulting in significant performance inconsistencies. This variability has limited the scalability and widespread adoption of these devices. Here, a major advancement is achieved through continuous-wave (CW) visible light (405 nm and 520 nm) trimming of plasma-enhanced chemical vapor deposition (PECVD) silicon-rich nitride (SRN) waveguides. The demonstrated method achieves precise, bidirectional refractive index tuning with a single laser source in CMOS-compatible SRN samples with refractive indices of 2.4 and 2.9 (measured at 1550 nm). By utilizing a cost-effective setup for real-time resonance tracking in micro-ring resonators, the resonant wavelength shifts as fine as 10 pm are attained. Additionally, a record red shift of 49.1 nm and a substantial blue shift of 10.6 nm are demonstrated, corresponding to refractive index changes of approximately 0.11 and -0.02. The blue and red shifts are both conclusively attributed to thermal annealing. These results highlight SRN's exceptional capability for permanent optical tuning, establishing a foundation for stable, precisely controlled performance in phase-sensitive integrated photonic devices.
format Preprint
id arxiv_https___arxiv_org_abs_2412_06217
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Large Bidirectional Refractive Index Change in Silicon-rich Nitride via Visible Light Trimming
Belogolovskii, Dmitrii
Rahman, Md Masudur
Johnson, Karl
Fedorov, Vladimir
Grieco, Andrew
Alic, Nikola
Ndao, Abdoulaye
Yu, Paul K. L.
Fainman, Yeshaiahu
Optics
Applied Physics
Phase-sensitive integrated photonic devices are highly susceptible to minor manufacturing deviations, resulting in significant performance inconsistencies. This variability has limited the scalability and widespread adoption of these devices. Here, a major advancement is achieved through continuous-wave (CW) visible light (405 nm and 520 nm) trimming of plasma-enhanced chemical vapor deposition (PECVD) silicon-rich nitride (SRN) waveguides. The demonstrated method achieves precise, bidirectional refractive index tuning with a single laser source in CMOS-compatible SRN samples with refractive indices of 2.4 and 2.9 (measured at 1550 nm). By utilizing a cost-effective setup for real-time resonance tracking in micro-ring resonators, the resonant wavelength shifts as fine as 10 pm are attained. Additionally, a record red shift of 49.1 nm and a substantial blue shift of 10.6 nm are demonstrated, corresponding to refractive index changes of approximately 0.11 and -0.02. The blue and red shifts are both conclusively attributed to thermal annealing. These results highlight SRN's exceptional capability for permanent optical tuning, establishing a foundation for stable, precisely controlled performance in phase-sensitive integrated photonic devices.
title Large Bidirectional Refractive Index Change in Silicon-rich Nitride via Visible Light Trimming
topic Optics
Applied Physics
url https://arxiv.org/abs/2412.06217