Saved in:
Bibliographic Details
Main Authors: Calis, Metehan, Boddeti, Narasimha, Bunch, J. Scott
Format: Preprint
Published: 2024
Subjects:
Online Access:https://arxiv.org/abs/2412.09615
Tags: Add Tag
No Tags, Be the first to tag this record!
_version_ 1866912153826492416
author Calis, Metehan
Boddeti, Narasimha
Bunch, J. Scott
author_facet Calis, Metehan
Boddeti, Narasimha
Bunch, J. Scott
contents We measure the out-of-plane shear modulus of few-layer graphene (FLG) by a blister test. During the test, we employed a monolayer molybdenum disulfide (MoS2) membrane stacked onto FLG wells to facilitate the separation of FLG from the silicon oxide (SiOx) substrate. Using the deflection profile of the blister, we determine an average shear modulus G of 0.97 +- 0.15 GPa, and a free energy model incorporating the interfacial shear force is developed to calculate the adhesion energy between FLG and SiOx substrate. The experimental protocol can be extended to other two-dimensional (2D) materials and layered structures (LS) made from other materials (WS2, hBN, etc.) to characterize their interlayer interactions. These results provide valuable insight into the mechanics of 2D nano devices which is important in designing more complex flexible electronic devices and nanoelectromechanical systems.
format Preprint
id arxiv_https___arxiv_org_abs_2412_09615
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle Blister Test to Measure the Out-of-Plane Shear Modulus of Few-Layer Graphene
Calis, Metehan
Boddeti, Narasimha
Bunch, J. Scott
Mesoscale and Nanoscale Physics
We measure the out-of-plane shear modulus of few-layer graphene (FLG) by a blister test. During the test, we employed a monolayer molybdenum disulfide (MoS2) membrane stacked onto FLG wells to facilitate the separation of FLG from the silicon oxide (SiOx) substrate. Using the deflection profile of the blister, we determine an average shear modulus G of 0.97 +- 0.15 GPa, and a free energy model incorporating the interfacial shear force is developed to calculate the adhesion energy between FLG and SiOx substrate. The experimental protocol can be extended to other two-dimensional (2D) materials and layered structures (LS) made from other materials (WS2, hBN, etc.) to characterize their interlayer interactions. These results provide valuable insight into the mechanics of 2D nano devices which is important in designing more complex flexible electronic devices and nanoelectromechanical systems.
title Blister Test to Measure the Out-of-Plane Shear Modulus of Few-Layer Graphene
topic Mesoscale and Nanoscale Physics
url https://arxiv.org/abs/2412.09615