Non-perturbative cathodoluminescence microscopy of beam-sensitive materials
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arXiv
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| Main Authors: | , , , , , , , , , , , |
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| Format: | Preprint |
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2024
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| _version_ | 1866915065512329216 |
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| author | Bogroff, Malcolm Cowley, Gabriel Nicastro, Ariel Levy, David Wu, Yueh-Chun Mao, Nannan Yang, Tilo H. Zhang, Tianyi Kong, Jing Vasudevan, Rama Kelley, Kyle P. Lawrie, Benjamin J. |
| author_facet | Bogroff, Malcolm Cowley, Gabriel Nicastro, Ariel Levy, David Wu, Yueh-Chun Mao, Nannan Yang, Tilo H. Zhang, Tianyi Kong, Jing Vasudevan, Rama Kelley, Kyle P. Lawrie, Benjamin J. |
| contents | Cathodoluminescence microscopy is now a well-established and powerful tool for probing the photonic properties of nanoscale materials, but in many cases, nanophotonic materials are easily damaged by the electron-beam doses necessary to achieve reasonable cathodoluminescence signal-to-noise ratios. Two-dimensional materials have proven particularly susceptible to beam-induced modifications, yielding both obstacles to high spatial-resolution measurement and opportunities for beam-induced patterning of quantum photonic systems. Here pan-sharpening techniques are applied to cathodoluminescence microscopy in order to address these challenges and experimentally demonstrate the promise of pan-sharpening for minimally-perturbative high-spatial-resolution spectrum imaging of beam-sensitive materials. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2412_11413 |
| institution | arXiv |
| publishDate | 2024 |
| record_format | arxiv |
| spellingShingle | Non-perturbative cathodoluminescence microscopy of beam-sensitive materials Bogroff, Malcolm Cowley, Gabriel Nicastro, Ariel Levy, David Wu, Yueh-Chun Mao, Nannan Yang, Tilo H. Zhang, Tianyi Kong, Jing Vasudevan, Rama Kelley, Kyle P. Lawrie, Benjamin J. Optics Mesoscale and Nanoscale Physics Cathodoluminescence microscopy is now a well-established and powerful tool for probing the photonic properties of nanoscale materials, but in many cases, nanophotonic materials are easily damaged by the electron-beam doses necessary to achieve reasonable cathodoluminescence signal-to-noise ratios. Two-dimensional materials have proven particularly susceptible to beam-induced modifications, yielding both obstacles to high spatial-resolution measurement and opportunities for beam-induced patterning of quantum photonic systems. Here pan-sharpening techniques are applied to cathodoluminescence microscopy in order to address these challenges and experimentally demonstrate the promise of pan-sharpening for minimally-perturbative high-spatial-resolution spectrum imaging of beam-sensitive materials. |
| title | Non-perturbative cathodoluminescence microscopy of beam-sensitive materials |
| topic | Optics Mesoscale and Nanoscale Physics |
| url | https://arxiv.org/abs/2412.11413 |