New models of clean and hydrogenated amorphous silicon surfaces

Fuente: arXiv
Saved in:
Bibliographic Details
Main Authors: Nepal, Kishor, Gautam, Aashish, Ugwumadu, Chinonso, Drabold, David
Format: Preprint
Published: 2024
Subjects:
Online Access:
Tags: Add Tag
No Tags, Be the first to tag this record!
_version_ 1866911017726902272
author Nepal, Kishor
Gautam, Aashish
Ugwumadu, Chinonso
Drabold, David
author_facet Nepal, Kishor
Gautam, Aashish
Ugwumadu, Chinonso
Drabold, David
contents We present new atomistic models of amorphous silicon (a-Si) and hydrogenated amorphous silicon (a-Si:H) surfaces. The a-Si model included 4096 atoms and was obtained using local orbital density functional theory. By analyzing a slab model (periodic in two dimensions with a slab about 44 Å thick), we observed a strong correlation between surface structure and surface charge density, which might be compared to STM experiments. Hydrogen atoms added near the under-coordinated surface atoms passivate dangling bonds and induce structural rearrangements. We analyze the electronic structure, including the localization of the states, and note resonant mixing between bulk and surface defect structures. We also compute the classical normal modes of the hydrogenated a-Si and compare them to experiments where possible. Our work is a step toward understanding the meaning of ``surface reconstruction" for a noncrystalline material.
format Preprint
id arxiv_https___arxiv_org_abs_2412_14270
institution arXiv
publishDate 2024
record_format arxiv
spellingShingle New models of clean and hydrogenated amorphous silicon surfaces
Nepal, Kishor
Gautam, Aashish
Ugwumadu, Chinonso
Drabold, David
Materials Science
We present new atomistic models of amorphous silicon (a-Si) and hydrogenated amorphous silicon (a-Si:H) surfaces. The a-Si model included 4096 atoms and was obtained using local orbital density functional theory. By analyzing a slab model (periodic in two dimensions with a slab about 44 Å thick), we observed a strong correlation between surface structure and surface charge density, which might be compared to STM experiments. Hydrogen atoms added near the under-coordinated surface atoms passivate dangling bonds and induce structural rearrangements. We analyze the electronic structure, including the localization of the states, and note resonant mixing between bulk and surface defect structures. We also compute the classical normal modes of the hydrogenated a-Si and compare them to experiments where possible. Our work is a step toward understanding the meaning of ``surface reconstruction" for a noncrystalline material.
title New models of clean and hydrogenated amorphous silicon surfaces
topic Materials Science
url https://arxiv.org/abs/2412.14270