Extraordinary oxidation behavior of W-Zr thin-film metallic glasses: A route for tailoring functional properties of W-Zr-O films
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arXiv
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| Format: | Preprint |
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2024
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| _version_ | 1866909436235218944 |
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| author | Zeman, Petr Červená, Michaela Houška, Jiří Haviar, Stanislav Rezek, Jiří Zuzjaková, Šárka |
| author_facet | Zeman, Petr Červená, Michaela Houška, Jiří Haviar, Stanislav Rezek, Jiří Zuzjaková, Šárka |
| contents | The oxidation behavior of W-Zr thin-film metallic glasses (TFMGs) with 32, 48 and 61 at.% Zr, prepared by dc magnetron co-sputtering, was comprehensively studied after annealing in synthetic air. The study focuses on the effect of the annealing temperature (up to 600°C) on the oxidation process, oxygen saturation, structure evolution, and their subsequent impact on electrical, optical and mechanical properties. The findings reveal that controlled oxidation transforms W-Zr TFMGs into amorphous ceramic W-Zr-O films with substoichiometric compositions. This is a consequence of an oxidation process that does not proceed through the formation of a stoichiometric oxide layer on the surface of W-Zr TFMGs, acting as a diffusion barrier against fast oxidation, but leads to a gradual incorporation of oxygen across the film volume due to thermodynamics factors. Higher Zr content accelerates the oxygen incorporation and its depth uniformity in the films. As a result, the mechanical properties are significantly enhanced achieving hardness values of up to 17.5 GPa at approximately 50% oxygen saturation. Simultaneously, the electrical and optical properties are finely tuned with the resistivity and the extinction coefficient (measured at 550 nm) ranging from 1.7 to 95.7x10-4 Ohm.cm and 0.28 to 1.06, respectively. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2412_15943 |
| institution | arXiv |
| publishDate | 2024 |
| record_format | arxiv |
| spellingShingle | Extraordinary oxidation behavior of W-Zr thin-film metallic glasses: A route for tailoring functional properties of W-Zr-O films Zeman, Petr Červená, Michaela Houška, Jiří Haviar, Stanislav Rezek, Jiří Zuzjaková, Šárka Materials Science The oxidation behavior of W-Zr thin-film metallic glasses (TFMGs) with 32, 48 and 61 at.% Zr, prepared by dc magnetron co-sputtering, was comprehensively studied after annealing in synthetic air. The study focuses on the effect of the annealing temperature (up to 600°C) on the oxidation process, oxygen saturation, structure evolution, and their subsequent impact on electrical, optical and mechanical properties. The findings reveal that controlled oxidation transforms W-Zr TFMGs into amorphous ceramic W-Zr-O films with substoichiometric compositions. This is a consequence of an oxidation process that does not proceed through the formation of a stoichiometric oxide layer on the surface of W-Zr TFMGs, acting as a diffusion barrier against fast oxidation, but leads to a gradual incorporation of oxygen across the film volume due to thermodynamics factors. Higher Zr content accelerates the oxygen incorporation and its depth uniformity in the films. As a result, the mechanical properties are significantly enhanced achieving hardness values of up to 17.5 GPa at approximately 50% oxygen saturation. Simultaneously, the electrical and optical properties are finely tuned with the resistivity and the extinction coefficient (measured at 550 nm) ranging from 1.7 to 95.7x10-4 Ohm.cm and 0.28 to 1.06, respectively. |
| title | Extraordinary oxidation behavior of W-Zr thin-film metallic glasses: A route for tailoring functional properties of W-Zr-O films |
| topic | Materials Science |
| url | https://arxiv.org/abs/2412.15943 |