Atomic layer etching of SiO$_2$ using sequential SF$_6$ gas and Ar plasma

Fuente: arXiv

Saved in:

Bibliographic Details
Main Authors:	Peng, Jun, Venugopal, Rakshith, Blick, Robert, Zierold, Robert
Format:	Preprint
Published:	2024
Subjects:	Materials Science
Online Access:	Acceder al recurso
Tags:	Add Tag No Tags, Be the first to tag this record!

Internet

https://arxiv.org/abs/2412.20653