Sputtering Current Driven Growth & Transport Characteristics of Superconducting Ti40V60 Alloy Thin Films

Fuente: arXiv
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Main Authors: Pandey, Shekhar Chandra, Sharma, Shilpam, Pandey, K. K., Gupta, Pooja, Rai, Sanjay, Singh, Rashmi, Chattopadhyay, M. K.
Format: Preprint
Published: 2025
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_version_ 1866918095404138496
author Pandey, Shekhar Chandra
Sharma, Shilpam
Pandey, K. K.
Gupta, Pooja
Rai, Sanjay
Singh, Rashmi
Chattopadhyay, M. K.
author_facet Pandey, Shekhar Chandra
Sharma, Shilpam
Pandey, K. K.
Gupta, Pooja
Rai, Sanjay
Singh, Rashmi
Chattopadhyay, M. K.
contents The room temperature growth, characterization, and electrical transport properties of magnetron sputtered superconducting Ti40V60 alloy thin films are presented. The films exhibit low surface roughness and tunable transport properties. As the sputtering current increases, the superconducting transition move towards higher temperatures. Rietveld refinement of two dimensional XRD (2D XRD) pattern reveals the presence of stress in the films, which shifts from tensile to compressive as the sputtering current increases. Additionally, the crystallite size of the films increases with higher sputtering currents. The films exhibit a strong preferential orientation, contributing to their texturing. The crystallite size and texturing are found to be correlated with the superconducting transition temperature (TC) of the films. As the crystallite size and texturing increase, the TC of the films also rises.
format Preprint
id arxiv_https___arxiv_org_abs_2501_00812
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Sputtering Current Driven Growth & Transport Characteristics of Superconducting Ti40V60 Alloy Thin Films
Pandey, Shekhar Chandra
Sharma, Shilpam
Pandey, K. K.
Gupta, Pooja
Rai, Sanjay
Singh, Rashmi
Chattopadhyay, M. K.
Superconductivity
The room temperature growth, characterization, and electrical transport properties of magnetron sputtered superconducting Ti40V60 alloy thin films are presented. The films exhibit low surface roughness and tunable transport properties. As the sputtering current increases, the superconducting transition move towards higher temperatures. Rietveld refinement of two dimensional XRD (2D XRD) pattern reveals the presence of stress in the films, which shifts from tensile to compressive as the sputtering current increases. Additionally, the crystallite size of the films increases with higher sputtering currents. The films exhibit a strong preferential orientation, contributing to their texturing. The crystallite size and texturing are found to be correlated with the superconducting transition temperature (TC) of the films. As the crystallite size and texturing increase, the TC of the films also rises.
title Sputtering Current Driven Growth & Transport Characteristics of Superconducting Ti40V60 Alloy Thin Films
topic Superconductivity
url https://arxiv.org/abs/2501.00812