Reconfigurable Filamentary Conduction in Thermally Stable Zeolitic Imidazolate Framework (ZIF-8) Resistive Switching Devices

Fuente: arXiv
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Autori principali: Kaushik, Divya, Kumar, Nitin, Sharma, Harshit, Prajapat, Pukhraj, V., Mehamalini, Sambandamurthy, G., Srivastava, Ritu
Natura: Preprint
Pubblicazione: 2025
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author Kaushik, Divya
Kumar, Nitin
Sharma, Harshit
Prajapat, Pukhraj
V., Mehamalini
Sambandamurthy, G.
Srivastava, Ritu
author_facet Kaushik, Divya
Kumar, Nitin
Sharma, Harshit
Prajapat, Pukhraj
V., Mehamalini
Sambandamurthy, G.
Srivastava, Ritu
contents The rapid growth of digital technology has driven the need for efficient storage solutions, positioning memristors as promising candidates for next-generation non-volatile memory (NVM) due to their superior electrical properties. Organic and inorganic materials each offer distinct advantages for resistive switching (RS) performance, while hybrid materials like metal-organic frameworks (MOFs) combine the strengths of both. In this study, we present a resistive random-access memory (ReRAM) device utilizing zeolitic imidazolate framework (ZIF-8), a MOF material, as the resistive switching layer. The ZIF-8 film was synthesized via a simple solution process method at room temperature and subsequently characterized. The Al/ZIF-8/ITO device demonstrates bipolar resistive switching behaviour with an on/off resistance ratio of 100, stable retention up to 10000 seconds, and consistent performance across 60 cycles while exhibiting robust thermal stability from -20 C to 100 C. Low-frequency noise and impedance spectroscopy measurements suggest a filamentary switching mechanism. Additionally, the memory state can be tuned by adjusting the reset voltage, pointing to potential as multi-level memory. Potentiation and depression experiments further highlight the devices promise for neuromorphic applications. With high stability, tunability, and strong performance, the ZIF-8 based ReRAM shows great promise for advanced NVM and neuromorphic computing applications.
format Preprint
id arxiv_https___arxiv_org_abs_2501_01822
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Reconfigurable Filamentary Conduction in Thermally Stable Zeolitic Imidazolate Framework (ZIF-8) Resistive Switching Devices
Kaushik, Divya
Kumar, Nitin
Sharma, Harshit
Prajapat, Pukhraj
V., Mehamalini
Sambandamurthy, G.
Srivastava, Ritu
Materials Science
Mesoscale and Nanoscale Physics
The rapid growth of digital technology has driven the need for efficient storage solutions, positioning memristors as promising candidates for next-generation non-volatile memory (NVM) due to their superior electrical properties. Organic and inorganic materials each offer distinct advantages for resistive switching (RS) performance, while hybrid materials like metal-organic frameworks (MOFs) combine the strengths of both. In this study, we present a resistive random-access memory (ReRAM) device utilizing zeolitic imidazolate framework (ZIF-8), a MOF material, as the resistive switching layer. The ZIF-8 film was synthesized via a simple solution process method at room temperature and subsequently characterized. The Al/ZIF-8/ITO device demonstrates bipolar resistive switching behaviour with an on/off resistance ratio of 100, stable retention up to 10000 seconds, and consistent performance across 60 cycles while exhibiting robust thermal stability from -20 C to 100 C. Low-frequency noise and impedance spectroscopy measurements suggest a filamentary switching mechanism. Additionally, the memory state can be tuned by adjusting the reset voltage, pointing to potential as multi-level memory. Potentiation and depression experiments further highlight the devices promise for neuromorphic applications. With high stability, tunability, and strong performance, the ZIF-8 based ReRAM shows great promise for advanced NVM and neuromorphic computing applications.
title Reconfigurable Filamentary Conduction in Thermally Stable Zeolitic Imidazolate Framework (ZIF-8) Resistive Switching Devices
topic Materials Science
Mesoscale and Nanoscale Physics
url https://arxiv.org/abs/2501.01822