Deposition Rates in Thermal Laser Epitaxy: Simulation and Experiment

Fuente: arXiv
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Main Authors: Smart, Thomas J., Abali, Bilen Emek, Boschker, Hans, Braun, Wolfgang
Format: Preprint
Published: 2025
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_version_ 1866916550180601856
author Smart, Thomas J.
Abali, Bilen Emek
Boschker, Hans
Braun, Wolfgang
author_facet Smart, Thomas J.
Abali, Bilen Emek
Boschker, Hans
Braun, Wolfgang
contents The modeling of deposition rates in Thermal Laser Epitaxy (TLE) is essential for the accurate prediction of the evaporation process and for improved dynamic process control. We demonstrate excellent agreement between experimental data and a model based on a finite element simulation that describes the temperature distribution of an elemental source when irradiated with continuous wave laser radiation. The simulation strongly depends on the thermophysical constants of the material, data of which is lacking for many elements. Effective values for the parameters may be determined with precision by means of an unambiguous reference provided by the melting point of the material, which is directly observed during the experiments. TLE may therefore be used to study the high temperature thermophysical and optical properties of the elements.
format Preprint
id arxiv_https___arxiv_org_abs_2501_01859
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Deposition Rates in Thermal Laser Epitaxy: Simulation and Experiment
Smart, Thomas J.
Abali, Bilen Emek
Boschker, Hans
Braun, Wolfgang
Computational Engineering, Finance, and Science
Computational Physics
The modeling of deposition rates in Thermal Laser Epitaxy (TLE) is essential for the accurate prediction of the evaporation process and for improved dynamic process control. We demonstrate excellent agreement between experimental data and a model based on a finite element simulation that describes the temperature distribution of an elemental source when irradiated with continuous wave laser radiation. The simulation strongly depends on the thermophysical constants of the material, data of which is lacking for many elements. Effective values for the parameters may be determined with precision by means of an unambiguous reference provided by the melting point of the material, which is directly observed during the experiments. TLE may therefore be used to study the high temperature thermophysical and optical properties of the elements.
title Deposition Rates in Thermal Laser Epitaxy: Simulation and Experiment
topic Computational Engineering, Finance, and Science
Computational Physics
url https://arxiv.org/abs/2501.01859