Stacking-dependent Electronic and Topological Properties in van der Waals Antiferromagnet MnBi$_2$Te$_4$ Films

Fuente: arXiv

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Bibliographic Details
Main Authors:	Li, Jiaheng, Wu, Quansheng, Weng, Hongming
Format:	Preprint
Published:	2025
Subjects:	Materials Science
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2501.02734