Stacking-dependent Electronic and Topological Properties in van der Waals Antiferromagnet MnBi$_2$Te$_4$ Films

Fuente: arXiv
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Autori principali: Li, Jiaheng, Wu, Quansheng, Weng, Hongming
Natura: Preprint
Pubblicazione: 2025
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author Li, Jiaheng
Wu, Quansheng
Weng, Hongming
author_facet Li, Jiaheng
Wu, Quansheng
Weng, Hongming
contents Combining first-principles calculations and tight-binding Hamiltonians, we study the stack-dependent behaviour of electronic and topological properties of layered antiferromagnet MnBi$_2$Te$_4$. Lateral shift of top septuple-layer greatly modify electronic properties, and even induce topological phase transition between quantum anomalous Hall (QAH) insulators with $C=1$ and trivial magnetic insulators with $C=0$. The local energy minimum of ``incorrect" stacking order exhibits thickness-dependent topology opposite to the usual stacking order, which is attribute to relatively weakened interlayer Te-Te interaction in ``incorrect" stacking configuration. Our effective model analysis provides a comprehensive understanding of the underlying mechanisms involved, and we also propose two optical setups that can effectively differentiate between different stacking configurations. Our findings underscores the nuanced and profound influence that interlayer sliding in magnetic topological materials can have on the macroscopic quantum states, opening new avenues for the design and engineering of topological quantum materials.
format Preprint
id arxiv_https___arxiv_org_abs_2501_02734
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Stacking-dependent Electronic and Topological Properties in van der Waals Antiferromagnet MnBi$_2$Te$_4$ Films
Li, Jiaheng
Wu, Quansheng
Weng, Hongming
Materials Science
Combining first-principles calculations and tight-binding Hamiltonians, we study the stack-dependent behaviour of electronic and topological properties of layered antiferromagnet MnBi$_2$Te$_4$. Lateral shift of top septuple-layer greatly modify electronic properties, and even induce topological phase transition between quantum anomalous Hall (QAH) insulators with $C=1$ and trivial magnetic insulators with $C=0$. The local energy minimum of ``incorrect" stacking order exhibits thickness-dependent topology opposite to the usual stacking order, which is attribute to relatively weakened interlayer Te-Te interaction in ``incorrect" stacking configuration. Our effective model analysis provides a comprehensive understanding of the underlying mechanisms involved, and we also propose two optical setups that can effectively differentiate between different stacking configurations. Our findings underscores the nuanced and profound influence that interlayer sliding in magnetic topological materials can have on the macroscopic quantum states, opening new avenues for the design and engineering of topological quantum materials.
title Stacking-dependent Electronic and Topological Properties in van der Waals Antiferromagnet MnBi$_2$Te$_4$ Films
topic Materials Science
url https://arxiv.org/abs/2501.02734