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Main Authors: Bader, Joshua, Lim, Shao Qi, Inam, Faraz Ahmed, Johnson, Brett C., Peruzzo, Alberto, McCallum, Jeffrey, Li, Qing, Castelletto, Stefania
Format: Preprint
Published: 2025
Subjects:
Online Access:https://arxiv.org/abs/2501.02755
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author Bader, Joshua
Lim, Shao Qi
Inam, Faraz Ahmed
Johnson, Brett C.
Peruzzo, Alberto
McCallum, Jeffrey
Li, Qing
Castelletto, Stefania
author_facet Bader, Joshua
Lim, Shao Qi
Inam, Faraz Ahmed
Johnson, Brett C.
Peruzzo, Alberto
McCallum, Jeffrey
Li, Qing
Castelletto, Stefania
contents Colour centres hosted in solid-state materials such as silicon carbide and diamond are promising candidates for integration into chip-scale quantum systems. Specifically, the incorporation of these colour centres within photonic integrated circuits may enable precise control over their inherent photo-physical properties through strong light-matter interaction. Here, we investigate ion-implanted erbium ($\text{Er}^{3+}$) defects embedded in thin-film 4H-silicon-carbide-on-insulator (4H-SiCOI). Optimized implantation conditions and thermal annealing processes designed to enhance the emission characteristics of the $\text{Er}^{3+}$-defect are reported. By examining key properties such as photoluminescence intensity, optical lifetime, and polarization, we present an analysis of ensemble $\text{Er}^{3+}$-defects within 4H-SiCOI, providing insights into their potential for future quantum applications.
format Preprint
id arxiv_https___arxiv_org_abs_2501_02755
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Photo-luminescence properties of ion implanted Er3+-defects in 4H-SiCOI towards integrated quantum photonics
Bader, Joshua
Lim, Shao Qi
Inam, Faraz Ahmed
Johnson, Brett C.
Peruzzo, Alberto
McCallum, Jeffrey
Li, Qing
Castelletto, Stefania
Optics
Materials Science
Colour centres hosted in solid-state materials such as silicon carbide and diamond are promising candidates for integration into chip-scale quantum systems. Specifically, the incorporation of these colour centres within photonic integrated circuits may enable precise control over their inherent photo-physical properties through strong light-matter interaction. Here, we investigate ion-implanted erbium ($\text{Er}^{3+}$) defects embedded in thin-film 4H-silicon-carbide-on-insulator (4H-SiCOI). Optimized implantation conditions and thermal annealing processes designed to enhance the emission characteristics of the $\text{Er}^{3+}$-defect are reported. By examining key properties such as photoluminescence intensity, optical lifetime, and polarization, we present an analysis of ensemble $\text{Er}^{3+}$-defects within 4H-SiCOI, providing insights into their potential for future quantum applications.
title Photo-luminescence properties of ion implanted Er3+-defects in 4H-SiCOI towards integrated quantum photonics
topic Optics
Materials Science
url https://arxiv.org/abs/2501.02755