A reduced-temperature process for preparing atomically clean Si(100) and SiGe(100) surfaces with vapor HF

Fuente: arXiv

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Bibliographic Details
Main Authors:	Peña, Luis Fabián, Anderson, Evan M., Mudrick, John P., Rosenberg, Samantha G., Scrymgeour, David A., Bussmann, Ezra, Misra, Shashank
Format:	Preprint
Published:	2025
Subjects:	Materials Science Applied Physics Chemical Physics
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2501.05620