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A reduced-temperature process for preparing atomically clean Si(100) and SiGe(100) surfaces with vapor HF

Fuente: arXiv

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Détails bibliographiques
Auteurs principaux:	Peña, Luis Fabián, Anderson, Evan M., Mudrick, John P., Rosenberg, Samantha G., Scrymgeour, David A., Bussmann, Ezra, Misra, Shashank
Format:	Preprint
Publié:	2025
Sujets:	Materials Science Applied Physics Chemical Physics
Accès en ligne:	Acceder al recurso
Tags:	Ajouter un tag Pas de tags, Soyez le premier à ajouter un tag!

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