The coupling of polarization and oxygen vacancy migration in ferroelectric Hf0.5Zr0.5O2 thin films enables electrically controlled thermal memories above room temperature

Fuente: arXiv
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Main Authors: Barneo, Didac, Ramos, Rafael, Romero, Hugo, Leboran, Victor, Varela-Dominguez, Noa, Pardo, Jose A., Rivadulla, Francisco, Langenberg, Eric
Format: Preprint
Published: 2025
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author Barneo, Didac
Ramos, Rafael
Romero, Hugo
Leboran, Victor
Varela-Dominguez, Noa
Pardo, Jose A.
Rivadulla, Francisco
Langenberg, Eric
author_facet Barneo, Didac
Ramos, Rafael
Romero, Hugo
Leboran, Victor
Varela-Dominguez, Noa
Pardo, Jose A.
Rivadulla, Francisco
Langenberg, Eric
contents Here we investigate epitaxial Hf0.5Zr0.5O2 ferroelectric thin films as potential candidates to be used as non-volatile electric-field-modulated thermal memories. The electric-field dependence of the thermal conductivity of metal/Hf0.5Zr0.5O2/YSZ devices is found to be hysteretic, resembling the polarization vs electric field hysteresis loops, being maximum (minimum) at large applied positive (negative) voltages from the top metallic electrode. This dynamic thermal response is compatible with the coupling between the ferroelectric polarization and the oxygen ion migration, in which the oxygen vacancies are the main phonon scattering sources and the polarization acts as an electrically active ion migration barrier that creates the hysteresis. This new mechanism enables two non-volatile thermal states: high (ON) and low (OFF) thermal conductivity, with an ON/OFF ratio of 1.6. Both the ON and OFF states exhibit high stability over time, though the switching speed is limited by ion mobility in the YSZ electrode.
format Preprint
id arxiv_https___arxiv_org_abs_2501_06005
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle The coupling of polarization and oxygen vacancy migration in ferroelectric Hf0.5Zr0.5O2 thin films enables electrically controlled thermal memories above room temperature
Barneo, Didac
Ramos, Rafael
Romero, Hugo
Leboran, Victor
Varela-Dominguez, Noa
Pardo, Jose A.
Rivadulla, Francisco
Langenberg, Eric
Materials Science
Applied Physics
Here we investigate epitaxial Hf0.5Zr0.5O2 ferroelectric thin films as potential candidates to be used as non-volatile electric-field-modulated thermal memories. The electric-field dependence of the thermal conductivity of metal/Hf0.5Zr0.5O2/YSZ devices is found to be hysteretic, resembling the polarization vs electric field hysteresis loops, being maximum (minimum) at large applied positive (negative) voltages from the top metallic electrode. This dynamic thermal response is compatible with the coupling between the ferroelectric polarization and the oxygen ion migration, in which the oxygen vacancies are the main phonon scattering sources and the polarization acts as an electrically active ion migration barrier that creates the hysteresis. This new mechanism enables two non-volatile thermal states: high (ON) and low (OFF) thermal conductivity, with an ON/OFF ratio of 1.6. Both the ON and OFF states exhibit high stability over time, though the switching speed is limited by ion mobility in the YSZ electrode.
title The coupling of polarization and oxygen vacancy migration in ferroelectric Hf0.5Zr0.5O2 thin films enables electrically controlled thermal memories above room temperature
topic Materials Science
Applied Physics
url https://arxiv.org/abs/2501.06005