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Benchmarking analytical electron ptychography methods for the low-dose imaging of beam-sensitive materials

Fuente: arXiv

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Bibliographic Details
Main Authors:	Robert, Hoelen L. Lalandec, Leidl, Max Leo, Müller-Caspary, Knut, Verbeeck, Jo
Format:	Preprint
Published:	2025
Subjects:	Applied Physics
Online Access:	Acceder al recurso
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