Ordered InAs quantum dots on pre-patterned GaAs (0 0 1) by local oxidation nanolithography

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Autori principali: Martín-Sánchez, J., González, Y., González, L., Tello, M., García, R., Granados, D., García, J. M., Briones, F.
Natura: Preprint
Pubblicazione: 2025
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author Martín-Sánchez, J.
González, Y.
González, L.
Tello, M.
García, R.
Granados, D.
García, J. M.
Briones, F.
author_facet Martín-Sánchez, J.
González, Y.
González, L.
Tello, M.
García, R.
Granados, D.
García, J. M.
Briones, F.
contents Ordered InAs quantum dot (QD) arrays have been obtained on pre-patterned GaAs (0 0 1) substrates by atomic force microscopy (AFM) local oxidation nanolithography. Prior to InAs molecular beam epitaxy (MBE) deposition, an ordered square array of nanoholes is formed at the GaAs pre-patterned surface following in situ etching with atomic hydrogen. A low substrate temperature is maintained during the whole process in order to avoid pattern smoothing. Our results show that the density and dimensions of the nanoholes on the GaAs surface determine InAs QD size, nucleation site and InAs dose necessary for their formation. As a function of the geometrical parameters of the nanohole array, we can obtain either ordered 2D arrays of separated QD, closely packed QD or localized areas for QD formation.
format Preprint
id arxiv_https___arxiv_org_abs_2501_10849
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Ordered InAs quantum dots on pre-patterned GaAs (0 0 1) by local oxidation nanolithography
Martín-Sánchez, J.
González, Y.
González, L.
Tello, M.
García, R.
Granados, D.
García, J. M.
Briones, F.
Mesoscale and Nanoscale Physics
Quantum Physics
Ordered InAs quantum dot (QD) arrays have been obtained on pre-patterned GaAs (0 0 1) substrates by atomic force microscopy (AFM) local oxidation nanolithography. Prior to InAs molecular beam epitaxy (MBE) deposition, an ordered square array of nanoholes is formed at the GaAs pre-patterned surface following in situ etching with atomic hydrogen. A low substrate temperature is maintained during the whole process in order to avoid pattern smoothing. Our results show that the density and dimensions of the nanoholes on the GaAs surface determine InAs QD size, nucleation site and InAs dose necessary for their formation. As a function of the geometrical parameters of the nanohole array, we can obtain either ordered 2D arrays of separated QD, closely packed QD or localized areas for QD formation.
title Ordered InAs quantum dots on pre-patterned GaAs (0 0 1) by local oxidation nanolithography
topic Mesoscale and Nanoscale Physics
Quantum Physics
url https://arxiv.org/abs/2501.10849