Compact Ultra-low Loss Optical True Delay Line on Thin Film Lithium Niobate

Fuente: arXiv
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Hauptverfasser: Ren, Yuan, Nan, Boyang, Wu, Rongbo, Zheng, Yong, Liu, Ruixue, Song, Yunpeng, Wang, Min, Cheng, Ya
Format: Preprint
Veröffentlicht: 2025
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author Ren, Yuan
Nan, Boyang
Wu, Rongbo
Zheng, Yong
Liu, Ruixue
Song, Yunpeng
Wang, Min
Cheng, Ya
author_facet Ren, Yuan
Nan, Boyang
Wu, Rongbo
Zheng, Yong
Liu, Ruixue
Song, Yunpeng
Wang, Min
Cheng, Ya
contents We report the fabrication of an 8-meter-long thin-film lithium niobate (TFLN) optical true delay line (OTDL) using the photolithography-assisted chemomechanical etching (PLACE) technique, showing a low transmission loss of 0.036 dB/cm in the conventional telecom band.
format Preprint
id arxiv_https___arxiv_org_abs_2501_11843
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Compact Ultra-low Loss Optical True Delay Line on Thin Film Lithium Niobate
Ren, Yuan
Nan, Boyang
Wu, Rongbo
Zheng, Yong
Liu, Ruixue
Song, Yunpeng
Wang, Min
Cheng, Ya
Optics
Applied Physics
We report the fabrication of an 8-meter-long thin-film lithium niobate (TFLN) optical true delay line (OTDL) using the photolithography-assisted chemomechanical etching (PLACE) technique, showing a low transmission loss of 0.036 dB/cm in the conventional telecom band.
title Compact Ultra-low Loss Optical True Delay Line on Thin Film Lithium Niobate
topic Optics
Applied Physics
url https://arxiv.org/abs/2501.11843