Mechanism of Oxygen Reduction via Chemical Affinity in NiO/SiO2 Interfaces Irradiated with keV Energy Hydrogen and Helium Ions for Heterostructure Fabrication

Fuente: arXiv

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Bibliographic Details
Main Authors:	Mery, Mario, Gonzalez-Fuentes, Claudio, Stankovic, Igor, Nuñez, Jorge M., Valdés, Jorge E., Aguirre, Myriam H, García, Carlos
Format:	Preprint
Published:	2025
Subjects:	Materials Science
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2501.17101