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Mechanism of Oxygen Reduction via Chemical Affinity in NiO/SiO2 Interfaces Irradiated with keV Energy Hydrogen and Helium Ions for Heterostructure Fabrication

Fuente: arXiv

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Détails bibliographiques
Auteurs principaux:	Mery, Mario, Gonzalez-Fuentes, Claudio, Stankovic, Igor, Nuñez, Jorge M., Valdés, Jorge E., Aguirre, Myriam H, García, Carlos
Format:	Preprint
Publié:	2025
Sujets:	Materials Science
Accès en ligne:	Acceder al recurso
Tags:	Ajouter un tag Pas de tags, Soyez le premier à ajouter un tag!

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