Rogoza, J., Iwanski, J., Ludwiczak, K., Furtak, B., Dabrowska, A. K., Tokarczyk, M., . . . Wysmolek, A. (2025). Mitigation of Delamination of Epitaxial Large-Area Boron Nitride for Semiconductor Processing.
Style de citation Chicago (17e éd.)Rogoza, Jakub, Jakub Iwanski, Katarzyna Ludwiczak, Bartosz Furtak, Aleksandra Krystyna Dabrowska, Mateusz Tokarczyk, Johannes Binder, et Andrzej Wysmolek. Mitigation of Delamination of Epitaxial Large-Area Boron Nitride for Semiconductor Processing. 2025.
Style de citation MLA (9e éd.)Rogoza, Jakub, et al. Mitigation of Delamination of Epitaxial Large-Area Boron Nitride for Semiconductor Processing. 2025.
Attention : ces citations peuvent ne pas être correctes à 100%.