The effect of Carrier Doping and Thickness on the Electronic Structures of La$3$Ni$2$O$7$ Thin Films

Fuente: arXiv
Salvato in:
Dettagli Bibliografici
Autori principali: Shi, Haoliang, Huo, Zihao, Li, Guanlin, Ma, Hao, Cui, Tian, Yao, Dao-Xin, Duan, Defang
Natura: Preprint
Pubblicazione: 2025
Soggetti:
Accesso online:
Tags: Aggiungi Tag
Nessun Tag, puoi essere il primo ad aggiungerne!!
_version_ 1866915213559726080
author Shi, Haoliang
Huo, Zihao
Li, Guanlin
Ma, Hao
Cui, Tian
Yao, Dao-Xin
Duan, Defang
author_facet Shi, Haoliang
Huo, Zihao
Li, Guanlin
Ma, Hao
Cui, Tian
Yao, Dao-Xin
Duan, Defang
contents Recently, the superconductivity of bilayer nickelate La3Ni2O7 has been observed in the thin film at ambient pressure, facilitated by epitaxial strain. Here, we investigate the effects of film thickness and carrier doping on the electronic structure of La3Ni2O7 thin films with thickness of 0.5-3 unit cells (UC) using first-principles calculations. At an optimal doping concentration of 0.4 holes per formula unit for 2UC film, the Ni-"d" _("z" ^"2" ) interlayer bonding state metallizes, leading to the formation of γ pockets at the Fermi surface, which quantitatively matches the experimental results of angle-resolved photoemission spectroscopy (ARPES). These findings provide theoretical support for recent experimental observations of ambient-pressure superconductivity in La3Ni2O7 thin films and highlight the crucial role of film thickness and carrier doping in modulating electronic properties.
format Preprint
id arxiv_https___arxiv_org_abs_2502_04255
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle The effect of Carrier Doping and Thickness on the Electronic Structures of La$3$Ni$2$O$7$ Thin Films
Shi, Haoliang
Huo, Zihao
Li, Guanlin
Ma, Hao
Cui, Tian
Yao, Dao-Xin
Duan, Defang
Superconductivity
Recently, the superconductivity of bilayer nickelate La3Ni2O7 has been observed in the thin film at ambient pressure, facilitated by epitaxial strain. Here, we investigate the effects of film thickness and carrier doping on the electronic structure of La3Ni2O7 thin films with thickness of 0.5-3 unit cells (UC) using first-principles calculations. At an optimal doping concentration of 0.4 holes per formula unit for 2UC film, the Ni-"d" _("z" ^"2" ) interlayer bonding state metallizes, leading to the formation of γ pockets at the Fermi surface, which quantitatively matches the experimental results of angle-resolved photoemission spectroscopy (ARPES). These findings provide theoretical support for recent experimental observations of ambient-pressure superconductivity in La3Ni2O7 thin films and highlight the crucial role of film thickness and carrier doping in modulating electronic properties.
title The effect of Carrier Doping and Thickness on the Electronic Structures of La$3$Ni$2$O$7$ Thin Films
topic Superconductivity
url https://arxiv.org/abs/2502.04255