Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM

Fuente: arXiv

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Bibliographic Details
Main Authors:	Tsuyama, Tomoyuki, Oyama, Tatsuki, Azuma, Yu, Ohashi, Haruhisa, Irie, Masahiro, Yamakawa, Ayumi, Uetake, Shoko, Konno, Takayuki, Ukai, Takahiro, Ochiai, Kohei, Iwaoka, Nobuyuki, Hashimoto, Atsushi, Okuno, Yoshishige
Format:	Preprint
Published:	2025
Subjects:	Materials Science
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2502.09031