Phase selection and texturing in molybdenum oxide films grown by reactive magnetron sputtering
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| Main Authors: | , , , , , |
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| Format: | Preprint |
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2025
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| _version_ | 1866916665069928448 |
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| author | Lahiji, Faezeh A. F. Paul, Biplab Greczynski, Grzegorz Ramanath, Ganpati Febvrier, Arnaud le Eklund, Per |
| author_facet | Lahiji, Faezeh A. F. Paul, Biplab Greczynski, Grzegorz Ramanath, Ganpati Febvrier, Arnaud le Eklund, Per |
| contents | Molybdenum oxide films offer a rich variety of properties for diverse applications, but exclusive synthesis of desired phases is a major challenge. Here, we demonstrate that oxygen flow ratio fO2 = [O2]/[Ar+O2] is crucial not only for phase selection of non-layered monoclinic MoO2 and layered orthorhombic alpha-MoO3 but also for controlling grain size and preferred orientation. Both mica and sapphire support exclusive MoO2 formation in the 0.15 < fO2 < 0.25 window at deposition temperatures Tdep = 400 and 500 degree C and alpha-MoO3 formation in the 0.35 < fO2 < 0.5 window at 400 degree C. Within fO2 windows favoring exclusive phase formation, high fO2 fosters large grains with out-of-plane 0k0 texture, except for MoO2 films on c-sapphire that show no systematic trends. These findings provide a framework for rational synthesis of phase-pure monoclinic MoO2 and orthorhombic MoO3 with control over texture and microstructure to access desired properties. |
| format | Preprint |
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arxiv_https___arxiv_org_abs_2502_10589 |
| institution | arXiv |
| publishDate | 2025 |
| record_format | arxiv |
| spellingShingle | Phase selection and texturing in molybdenum oxide films grown by reactive magnetron sputtering Lahiji, Faezeh A. F. Paul, Biplab Greczynski, Grzegorz Ramanath, Ganpati Febvrier, Arnaud le Eklund, Per Materials Science Molybdenum oxide films offer a rich variety of properties for diverse applications, but exclusive synthesis of desired phases is a major challenge. Here, we demonstrate that oxygen flow ratio fO2 = [O2]/[Ar+O2] is crucial not only for phase selection of non-layered monoclinic MoO2 and layered orthorhombic alpha-MoO3 but also for controlling grain size and preferred orientation. Both mica and sapphire support exclusive MoO2 formation in the 0.15 < fO2 < 0.25 window at deposition temperatures Tdep = 400 and 500 degree C and alpha-MoO3 formation in the 0.35 < fO2 < 0.5 window at 400 degree C. Within fO2 windows favoring exclusive phase formation, high fO2 fosters large grains with out-of-plane 0k0 texture, except for MoO2 films on c-sapphire that show no systematic trends. These findings provide a framework for rational synthesis of phase-pure monoclinic MoO2 and orthorhombic MoO3 with control over texture and microstructure to access desired properties. |
| title | Phase selection and texturing in molybdenum oxide films grown by reactive magnetron sputtering |
| topic | Materials Science |
| url | https://arxiv.org/abs/2502.10589 |