Characterization of ion track etched conical nanopores in thermal and PECVD SiO$_{2}$ using small angle X-ray scattering

Documenti analoghi

• Analysis of SiO2 Thin Films Deposited by PECVD Using an Oxygen-TEOS-Argon Mixture
  di: Carlos E. Viana
  Pubblicazione: (2001)
• Intrinsic nonequilibrium distribution of large ions in charged small nanopores
  di: Qiao, Yu, et al.
  Pubblicazione: (2024)
• Positive mass theorem on conical manifold with small cone angle
  di: Gui, Yaoting
  Pubblicazione: (2024)
• Nanostructuring SiC by sequential plasma oxidation and reactive ion etching
  di: Isometsä, Joonas, et al.
  Pubblicazione: (2026)
• In-vacuum surface flashover of SiN, AlN, and etched SiO2 thin films at micrometre scales
  di: Kumar, Vijay, et al.
  Pubblicazione: (2025)