Atomic layer etching of niobium nitride using sequential exposures of O$_2$ and H$_2$/SF$_6$ plasmas

Fuente: arXiv

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Bibliographic Details
Main Authors:	Hossain, Azmain A., Murphy, Sela, Catherall, David S., Ardizzi, Anthony J., Minnich, Austin J.
Format:	Preprint
Published:	2025
Subjects:	Materials Science Superconductivity
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2502.17745