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Atomic layer etching of niobium nitride using sequential exposures of O$_2$ and H$_2$/SF$_6$ plasmas

Fuente: arXiv

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Dettagli Bibliografici
Autori principali:	Hossain, Azmain A., Murphy, Sela, Catherall, David S., Ardizzi, Anthony J., Minnich, Austin J.
Natura:	Preprint
Pubblicazione:	2025
Soggetti:	Materials Science Superconductivity
Accesso online:	Acceder al recurso
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