Reactive sputtering of SnS thin films using sulfur plasma and a metallic tin target: achieving stoichiometry and large grains

Fuente: arXiv

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Bibliographic Details
Main Authors:	Motai, Daiki, Suzuki, Issei, Nogami, Taichi, Omata, Takahisa
Format:	Preprint
Published:	2025
Subjects:	Materials Science
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2502.18922