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Main Authors: Chen, Jingxin, Huang, Xiang, Qiao, Zhihan, Li, Jiao, Xu, Jiahao, Zhang, Haiyang, Li, Deyang, Men, Enyang, Wang, Hangtian, Zhang, Han, Xie, Jianyu, Zheng, Guolin, Tian, Mingliang, Niu, Qun, Hao, Lin
Format: Preprint
Published: 2025
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Online Access:https://arxiv.org/abs/2502.18946
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author Chen, Jingxin
Huang, Xiang
Qiao, Zhihan
Li, Jiao
Xu, Jiahao
Zhang, Haiyang
Li, Deyang
Men, Enyang
Wang, Hangtian
Zhang, Han
Xie, Jianyu
Zheng, Guolin
Tian, Mingliang
Niu, Qun
Hao, Lin
author_facet Chen, Jingxin
Huang, Xiang
Qiao, Zhihan
Li, Jiao
Xu, Jiahao
Zhang, Haiyang
Li, Deyang
Men, Enyang
Wang, Hangtian
Zhang, Han
Xie, Jianyu
Zheng, Guolin
Tian, Mingliang
Niu, Qun
Hao, Lin
contents Electrical transport in oxide thin films under high pressure remains largely unexplored due to the lack of a universal experimental strategy. Here we develop an approach that enables high-pressure transport measurements in freestanding oxide films by enhancing their mechanical robustness and integrating them with nanoscale high-pressure devices. As a demonstration, we investigate the resistivity of perovskite SrIrO3 films under hydrostatic pressure and uncover a pressure-driven semimetal-insulator transition near 2.5 GPa, followed by an insulator-metal transition around 9 GPa. In the monolayer limit, SrIrO3 remains insulating and robust against pressure up to 5.5 GPa. The contrasting pressure-dependent phase diagrams of three- and two-dimensional iridates reveal a strong interplay between dimensionality and hydrostatic pressure in correlated oxides. Our work establishes a general platform for exploring pressure-driven phenomena in low-dimensional quantum materials.
format Preprint
id arxiv_https___arxiv_org_abs_2502_18946
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle High-Pressure Tuning of Electrical Transport in Freestanding Oxide Films
Chen, Jingxin
Huang, Xiang
Qiao, Zhihan
Li, Jiao
Xu, Jiahao
Zhang, Haiyang
Li, Deyang
Men, Enyang
Wang, Hangtian
Zhang, Han
Xie, Jianyu
Zheng, Guolin
Tian, Mingliang
Niu, Qun
Hao, Lin
Materials Science
Strongly Correlated Electrons
Electrical transport in oxide thin films under high pressure remains largely unexplored due to the lack of a universal experimental strategy. Here we develop an approach that enables high-pressure transport measurements in freestanding oxide films by enhancing their mechanical robustness and integrating them with nanoscale high-pressure devices. As a demonstration, we investigate the resistivity of perovskite SrIrO3 films under hydrostatic pressure and uncover a pressure-driven semimetal-insulator transition near 2.5 GPa, followed by an insulator-metal transition around 9 GPa. In the monolayer limit, SrIrO3 remains insulating and robust against pressure up to 5.5 GPa. The contrasting pressure-dependent phase diagrams of three- and two-dimensional iridates reveal a strong interplay between dimensionality and hydrostatic pressure in correlated oxides. Our work establishes a general platform for exploring pressure-driven phenomena in low-dimensional quantum materials.
title High-Pressure Tuning of Electrical Transport in Freestanding Oxide Films
topic Materials Science
Strongly Correlated Electrons
url https://arxiv.org/abs/2502.18946