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Dettagli Bibliografici
Autori principali: Chen, Jingxin, Huang, Xiang, Qiao, Zhihan, Li, Jiao, Xu, Jiahao, Zhang, Haiyang, Li, Deyang, Men, Enyang, Wang, Hangtian, Zhang, Han, Xie, Jianyu, Zheng, Guolin, Tian, Mingliang, Niu, Qun, Hao, Lin
Natura: Preprint
Pubblicazione: 2025
Soggetti:
Accesso online:https://arxiv.org/abs/2502.18946
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Sommario:
  • Electrical transport in oxide thin films under high pressure remains largely unexplored due to the lack of a universal experimental strategy. Here we develop an approach that enables high-pressure transport measurements in freestanding oxide films by enhancing their mechanical robustness and integrating them with nanoscale high-pressure devices. As a demonstration, we investigate the resistivity of perovskite SrIrO3 films under hydrostatic pressure and uncover a pressure-driven semimetal-insulator transition near 2.5 GPa, followed by an insulator-metal transition around 9 GPa. In the monolayer limit, SrIrO3 remains insulating and robust against pressure up to 5.5 GPa. The contrasting pressure-dependent phase diagrams of three- and two-dimensional iridates reveal a strong interplay between dimensionality and hydrostatic pressure in correlated oxides. Our work establishes a general platform for exploring pressure-driven phenomena in low-dimensional quantum materials.