Hybrid confinement techniques for polariton simulators
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arXiv
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2025
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| author | Düreth, Johannes Gagel, Philipp Laibacher, David Egorov, Oleg A. Widmann, Simon Betzold, Simon Emmerling, Monika Dam, Siddhartha Landry, Alexia Mayer, Christian G. Kamp, Martin Woyciechowska, Aniela Piętka, Barbara Peschel, Ulf Höfling, Sven Klembt, Sebastian |
| author_facet | Düreth, Johannes Gagel, Philipp Laibacher, David Egorov, Oleg A. Widmann, Simon Betzold, Simon Emmerling, Monika Dam, Siddhartha Landry, Alexia Mayer, Christian G. Kamp, Martin Woyciechowska, Aniela Piętka, Barbara Peschel, Ulf Höfling, Sven Klembt, Sebastian |
| contents | Exciton-polariton III-V semiconductor microcavities provide a robust platform for emulating complex Hamiltonians, enabling topological photonics and quantum simulation for advanced photonic functionalities. Here, we introduce two novel fabrication techniques - etch-and-oversputter and deposit-and-oversputter - that overcome limitations of traditional photonic confinement. Both use structured, locally elongated semiconductor cavities to create deep, highly controllable potentials, while leveraging high-quality GaAs-based materials, which achieve excellent Q-factors. A sputtered all-dielectric top mirror introduces an innovative hybrid approach, simplifying fabrication while maintaining quality compared to deep ion etching. Utilizing a Kagome lattice as a benchmark, we show high-quality optical band structures previously inaccessible with deep etching. Furthermore, we study a two-dimensional breathing Kagome lattice and demonstrate polariton lasing from a zero-dimensional corner mode, confirming precise control over couplings and tight polariton localization. These methods enable fabrication of intricate lattices, including higher-order topological insulators, or on-chip quantum regimes utilizing the polariton blockade mechanism due to tight photonic confinement. |
| format | Preprint |
| id |
arxiv_https___arxiv_org_abs_2503_02355 |
| institution | arXiv |
| publishDate | 2025 |
| record_format | arxiv |
| spellingShingle | Hybrid confinement techniques for polariton simulators Düreth, Johannes Gagel, Philipp Laibacher, David Egorov, Oleg A. Widmann, Simon Betzold, Simon Emmerling, Monika Dam, Siddhartha Landry, Alexia Mayer, Christian G. Kamp, Martin Woyciechowska, Aniela Piętka, Barbara Peschel, Ulf Höfling, Sven Klembt, Sebastian Optics Mesoscale and Nanoscale Physics Applied Physics Exciton-polariton III-V semiconductor microcavities provide a robust platform for emulating complex Hamiltonians, enabling topological photonics and quantum simulation for advanced photonic functionalities. Here, we introduce two novel fabrication techniques - etch-and-oversputter and deposit-and-oversputter - that overcome limitations of traditional photonic confinement. Both use structured, locally elongated semiconductor cavities to create deep, highly controllable potentials, while leveraging high-quality GaAs-based materials, which achieve excellent Q-factors. A sputtered all-dielectric top mirror introduces an innovative hybrid approach, simplifying fabrication while maintaining quality compared to deep ion etching. Utilizing a Kagome lattice as a benchmark, we show high-quality optical band structures previously inaccessible with deep etching. Furthermore, we study a two-dimensional breathing Kagome lattice and demonstrate polariton lasing from a zero-dimensional corner mode, confirming precise control over couplings and tight polariton localization. These methods enable fabrication of intricate lattices, including higher-order topological insulators, or on-chip quantum regimes utilizing the polariton blockade mechanism due to tight photonic confinement. |
| title | Hybrid confinement techniques for polariton simulators |
| topic | Optics Mesoscale and Nanoscale Physics Applied Physics |
| url | https://arxiv.org/abs/2503.02355 |