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Main Authors: Gremmel, Maike, Savant, Chandrashekhar Prakash, Bhattacharya, Debaditya, Schönweger, Georg, Jena, Debdeep, Fichtner, Simon
Format: Preprint
Published: 2025
Subjects:
Online Access:https://arxiv.org/abs/2503.08399
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author Gremmel, Maike
Savant, Chandrashekhar Prakash
Bhattacharya, Debaditya
Schönweger, Georg
Jena, Debdeep
Fichtner, Simon
author_facet Gremmel, Maike
Savant, Chandrashekhar Prakash
Bhattacharya, Debaditya
Schönweger, Georg
Jena, Debdeep
Fichtner, Simon
contents This study explores the influence of boron incorporation on the structural and electrical properties of ferroelectric Aluminum Scandium Nitride (Al_{1-x}Sc_xN ) thin films, focusing on leakage currents, wake-up effects, and imprint behavior. Al_{1-x}Sc_xN films were incorporated with varying boron concentrations and analyzed under different deposition conditions to determine their structural integrity and ferroelectric performance. Key findings include a reduction in leakage currents, non-trivial alterations in bandgap energy as well as an increasing coercive fields with increasing boron content. Films with 6-13 at.% boron exhibited N-polar growth, while those with 16 at.% boron showed mixed polarity after deposition, which affected their ferroelectric response during the initial switching cycles - as did the addition of boron itself compared to pure Al1-xScxN . With increasing boron content, wake-up became gradually more pronounced and was strongest for pure Al_{1-x}B_xN .
format Preprint
id arxiv_https___arxiv_org_abs_2503_08399
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle The effect of boron incorporation on leakage and wake-up in ferroelectric Al_{1-x}Sc_xN
Gremmel, Maike
Savant, Chandrashekhar Prakash
Bhattacharya, Debaditya
Schönweger, Georg
Jena, Debdeep
Fichtner, Simon
Materials Science
This study explores the influence of boron incorporation on the structural and electrical properties of ferroelectric Aluminum Scandium Nitride (Al_{1-x}Sc_xN ) thin films, focusing on leakage currents, wake-up effects, and imprint behavior. Al_{1-x}Sc_xN films were incorporated with varying boron concentrations and analyzed under different deposition conditions to determine their structural integrity and ferroelectric performance. Key findings include a reduction in leakage currents, non-trivial alterations in bandgap energy as well as an increasing coercive fields with increasing boron content. Films with 6-13 at.% boron exhibited N-polar growth, while those with 16 at.% boron showed mixed polarity after deposition, which affected their ferroelectric response during the initial switching cycles - as did the addition of boron itself compared to pure Al1-xScxN . With increasing boron content, wake-up became gradually more pronounced and was strongest for pure Al_{1-x}B_xN .
title The effect of boron incorporation on leakage and wake-up in ferroelectric Al_{1-x}Sc_xN
topic Materials Science
url https://arxiv.org/abs/2503.08399