Edge Exposure as the Trigger for Structural Instability in LP-N and HLP-N

Fuente: arXiv
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Main Authors: Chen, Guo, Wang, Xianlong
Format: Preprint
Published: 2025
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author Chen, Guo
Wang, Xianlong
author_facet Chen, Guo
Wang, Xianlong
contents LP-N and HLP-N are promising high-energy-density materials. However, these materials synthesized under high pressure cannot be maintained stable at ambient conditions. The mechanism behind their instability remains unclear. Our research, based on first-principles calculations and ab initio molecular dynamics simulations, reveals that while not edge exposed, LP-N and HLP-N exhibit substantial structural, dynamic, and mechanical stability under ambient conditions. The stability of HLP-N is governed by an interlocking mechanism, which becomes ineffective upon exposure of the edges, leading to internal breakdown. As a result, H saturated adsorption has no impact on it. In contrast, LP-N benefits modestly from H saturated adsorption due to its edge-initiated dissociation. The interlocking mechanism offer valuable insights into the design of new materials.
format Preprint
id arxiv_https___arxiv_org_abs_2503_11608
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Edge Exposure as the Trigger for Structural Instability in LP-N and HLP-N
Chen, Guo
Wang, Xianlong
Materials Science
Chemical Physics
LP-N and HLP-N are promising high-energy-density materials. However, these materials synthesized under high pressure cannot be maintained stable at ambient conditions. The mechanism behind their instability remains unclear. Our research, based on first-principles calculations and ab initio molecular dynamics simulations, reveals that while not edge exposed, LP-N and HLP-N exhibit substantial structural, dynamic, and mechanical stability under ambient conditions. The stability of HLP-N is governed by an interlocking mechanism, which becomes ineffective upon exposure of the edges, leading to internal breakdown. As a result, H saturated adsorption has no impact on it. In contrast, LP-N benefits modestly from H saturated adsorption due to its edge-initiated dissociation. The interlocking mechanism offer valuable insights into the design of new materials.
title Edge Exposure as the Trigger for Structural Instability in LP-N and HLP-N
topic Materials Science
Chemical Physics
url https://arxiv.org/abs/2503.11608