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Main Authors: Li, Yuanze, Yuan, Shihao, Wang, Haolin, Li, Qizhang, Liu, Ming, Xu, Chen, Shi, Guangming, Zuo, Wangmeng
Format: Preprint
Published: 2025
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Online Access:https://arxiv.org/abs/2503.13184
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author Li, Yuanze
Yuan, Shihao
Wang, Haolin
Li, Qizhang
Liu, Ming
Xu, Chen
Shi, Guangming
Zuo, Wangmeng
author_facet Li, Yuanze
Yuan, Shihao
Wang, Haolin
Li, Qizhang
Liu, Ming
Xu, Chen
Shi, Guangming
Zuo, Wangmeng
contents Although recent methods have tried to introduce large multimodal models (LMMs) into industrial anomaly detection (IAD), their generalization in the IAD field is far inferior to that for general purposes. We summarize the main reasons for this gap into two aspects. On one hand, general-purpose LMMs lack cognition of defects in the visual modality, thereby failing to sufficiently focus on defect areas. Therefore, we propose to modify the AnyRes structure of the LLaVA model, providing the potential anomalous areas identified by existing IAD models to the LMMs. On the other hand, existing methods mainly focus on identifying defects by learning defect patterns or comparing with normal samples, yet they fall short of understanding the causes of these defects. Considering that the generation of defects is closely related to the manufacturing process, we propose a manufacturing-driven IAD paradigm. An instruction-tuning dataset for IAD (InstructIAD) and a data organization approach for Chain-of-Thought with manufacturing (CoT-M) are designed to leverage the manufacturing process for IAD. Based on the above two modifications, we present Triad, a novel LMM-based method incorporating an expert-guided region-of-interest tokenizer and manufacturing process for industrial anomaly detection. Extensive experiments show that our Triad not only demonstrates competitive performance against current LMMs but also achieves further improved accuracy when equipped with manufacturing processes. Source code, training data, and pre-trained models will be publicly available at https://github.com/tzjtatata/Triad.
format Preprint
id arxiv_https___arxiv_org_abs_2503_13184
institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Triad: Empowering LMM-based Anomaly Detection with Vision Expert-guided Visual Tokenizer and Manufacturing Process
Li, Yuanze
Yuan, Shihao
Wang, Haolin
Li, Qizhang
Liu, Ming
Xu, Chen
Shi, Guangming
Zuo, Wangmeng
Computer Vision and Pattern Recognition
Although recent methods have tried to introduce large multimodal models (LMMs) into industrial anomaly detection (IAD), their generalization in the IAD field is far inferior to that for general purposes. We summarize the main reasons for this gap into two aspects. On one hand, general-purpose LMMs lack cognition of defects in the visual modality, thereby failing to sufficiently focus on defect areas. Therefore, we propose to modify the AnyRes structure of the LLaVA model, providing the potential anomalous areas identified by existing IAD models to the LMMs. On the other hand, existing methods mainly focus on identifying defects by learning defect patterns or comparing with normal samples, yet they fall short of understanding the causes of these defects. Considering that the generation of defects is closely related to the manufacturing process, we propose a manufacturing-driven IAD paradigm. An instruction-tuning dataset for IAD (InstructIAD) and a data organization approach for Chain-of-Thought with manufacturing (CoT-M) are designed to leverage the manufacturing process for IAD. Based on the above two modifications, we present Triad, a novel LMM-based method incorporating an expert-guided region-of-interest tokenizer and manufacturing process for industrial anomaly detection. Extensive experiments show that our Triad not only demonstrates competitive performance against current LMMs but also achieves further improved accuracy when equipped with manufacturing processes. Source code, training data, and pre-trained models will be publicly available at https://github.com/tzjtatata/Triad.
title Triad: Empowering LMM-based Anomaly Detection with Vision Expert-guided Visual Tokenizer and Manufacturing Process
topic Computer Vision and Pattern Recognition
url https://arxiv.org/abs/2503.13184