Low-loss Nb on Si superconducting resonators from a dual-use spintronics deposition chamber and with acid-free post-processing

Fuente: arXiv
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Auteurs principaux: Olszewski, Maciej W., Paustian, Jadrien T., Banerjee, Tathagata, Lu, Haoran, Ramirez, Jorge L., Nguyen, Nhi, Okubo, Kiichi, Pant, Rohit, Biedron, Aleksandra B., Ralph, Daniel C., Richardson, Christopher J. K., Fuchs, Gregory D., McRae, Corey Rae H., Pechenezhskiy, Ivan V., Plourde, B. L. T., Fatemi, Valla
Format: Preprint
Publié: 2025
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author Olszewski, Maciej W.
Paustian, Jadrien T.
Banerjee, Tathagata
Lu, Haoran
Ramirez, Jorge L.
Nguyen, Nhi
Okubo, Kiichi
Pant, Rohit
Biedron, Aleksandra B.
Ralph, Daniel C.
Richardson, Christopher J. K.
Fuchs, Gregory D.
McRae, Corey Rae H.
Pechenezhskiy, Ivan V.
Plourde, B. L. T.
Fatemi, Valla
author_facet Olszewski, Maciej W.
Paustian, Jadrien T.
Banerjee, Tathagata
Lu, Haoran
Ramirez, Jorge L.
Nguyen, Nhi
Okubo, Kiichi
Pant, Rohit
Biedron, Aleksandra B.
Ralph, Daniel C.
Richardson, Christopher J. K.
Fuchs, Gregory D.
McRae, Corey Rae H.
Pechenezhskiy, Ivan V.
Plourde, B. L. T.
Fatemi, Valla
contents Magnetic impurities are known to degrade superconductivity. For this reason, physical vapor deposition chambers that have previously been used for magnetic materials have generally been avoided for making high-quality superconducting resonator devices. In this article, we show by example that such chambers can be used for this purpose; with Nb films sputtered in a chamber that continues to be used for magnetic materials, we demonstrate compact (\SI{3}{\micro\meter} gap) coplanar waveguide resonators with low-power internal quality factors near one million. We achieve this using a resist strip bath with no post-fabrication acid treatment, which results in performance comparable to previous strip baths with acid treatments. We also find evidence that this improved resist strip bath provides a better surface chemical template for post-fabrication hydrogen fluoride processing. These results are consistent across three Si substrate preparation methods, including a \SI{700}{\celsius} anneal. These results will inform nanofabrication for other superconducting materials and the integration of magnetic materials for hybrid systems.
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institution arXiv
publishDate 2025
record_format arxiv
spellingShingle Low-loss Nb on Si superconducting resonators from a dual-use spintronics deposition chamber and with acid-free post-processing
Olszewski, Maciej W.
Paustian, Jadrien T.
Banerjee, Tathagata
Lu, Haoran
Ramirez, Jorge L.
Nguyen, Nhi
Okubo, Kiichi
Pant, Rohit
Biedron, Aleksandra B.
Ralph, Daniel C.
Richardson, Christopher J. K.
Fuchs, Gregory D.
McRae, Corey Rae H.
Pechenezhskiy, Ivan V.
Plourde, B. L. T.
Fatemi, Valla
Quantum Physics
Materials Science
Magnetic impurities are known to degrade superconductivity. For this reason, physical vapor deposition chambers that have previously been used for magnetic materials have generally been avoided for making high-quality superconducting resonator devices. In this article, we show by example that such chambers can be used for this purpose; with Nb films sputtered in a chamber that continues to be used for magnetic materials, we demonstrate compact (\SI{3}{\micro\meter} gap) coplanar waveguide resonators with low-power internal quality factors near one million. We achieve this using a resist strip bath with no post-fabrication acid treatment, which results in performance comparable to previous strip baths with acid treatments. We also find evidence that this improved resist strip bath provides a better surface chemical template for post-fabrication hydrogen fluoride processing. These results are consistent across three Si substrate preparation methods, including a \SI{700}{\celsius} anneal. These results will inform nanofabrication for other superconducting materials and the integration of magnetic materials for hybrid systems.
title Low-loss Nb on Si superconducting resonators from a dual-use spintronics deposition chamber and with acid-free post-processing
topic Quantum Physics
Materials Science
url https://arxiv.org/abs/2503.13285