Interaction-Induced Higher-Order Topological Insulator via Floquet Engineering

Fuente: arXiv

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Bibliographic Details
Main Authors:	Su, Chun-Ping, Cai, Zhao-Fan, Liu, Tao
Format:	Preprint
Published:	2025
Subjects:	Mesoscale and Nanoscale Physics Strongly Correlated Electrons Quantum Physics
Online Access:	Acceder al recurso
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Internet

https://arxiv.org/abs/2503.14516