Modulation of Charge Transport and Rectification Behavior in CsSnI3 Thin Films Through A-site Cation Engineering
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| Format: | Preprint |
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2025
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| author | Zarudnyaya, Anna A. Segal, Gleb V. Morozov, Andrey P. Luchnikov, Lev O. Yurchuk, Sergey Yu. Schemerov, Ivan V. Gostishchev, Pavel A. Saranin, Danila S. |
| author_facet | Zarudnyaya, Anna A. Segal, Gleb V. Morozov, Andrey P. Luchnikov, Lev O. Yurchuk, Sergey Yu. Schemerov, Ivan V. Gostishchev, Pavel A. Saranin, Danila S. |
| contents | CsSnI3 perovskite is a promising thin-film semiconductor with high intrinsic conductivity for various device applications (thermoelectric, photovoltaics, etc.). Stoichiometric CsSnI3 owns high-density of defects and structural imperfections affecting device performance. In this work, we made an investigation on A-site cation engineering to evaluate the correlation between structural and transport parameters for effective operation in rectifying devices. Here, we analyzed CsSnI3 thin films modified with methylamine (MA), formamidine(FA), guanidine(GuA) and 5-ammonium valeric acid (AVA) cations, correlating structural parameters obtained by Rietveld refinement with their optoelectronic and diode characteristics. MA-, FA-, and GuA-substituted films exhibited low sheet resistance (450-2200 Ohm per sq). However, strain-induced lattice distortions and accumulated defects in GuA-substituted films significantly hindered effective charge collection and increased recombination losses. AVA substitution formed low-conductivity 2D interlayers, dramatically increasing resistance (105 Ohm per sq) and altering transient response characteristics, yet provided minimal reverse-switching losses (100 uW per cm2), beneficial for high-frequency applications. FA substitution emerged as optimal, balancing structural stability, conductivity, minimal defects, and superior diode properties. The obtained results highlight that targeted lattice modifications strongly influence the practical performance of rectifying p-i-n diodes based on CsSnI3. |
| format | Preprint |
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arxiv_https___arxiv_org_abs_2503_16152 |
| institution | arXiv |
| publishDate | 2025 |
| record_format | arxiv |
| spellingShingle | Modulation of Charge Transport and Rectification Behavior in CsSnI3 Thin Films Through A-site Cation Engineering Zarudnyaya, Anna A. Segal, Gleb V. Morozov, Andrey P. Luchnikov, Lev O. Yurchuk, Sergey Yu. Schemerov, Ivan V. Gostishchev, Pavel A. Saranin, Danila S. Materials Science CsSnI3 perovskite is a promising thin-film semiconductor with high intrinsic conductivity for various device applications (thermoelectric, photovoltaics, etc.). Stoichiometric CsSnI3 owns high-density of defects and structural imperfections affecting device performance. In this work, we made an investigation on A-site cation engineering to evaluate the correlation between structural and transport parameters for effective operation in rectifying devices. Here, we analyzed CsSnI3 thin films modified with methylamine (MA), formamidine(FA), guanidine(GuA) and 5-ammonium valeric acid (AVA) cations, correlating structural parameters obtained by Rietveld refinement with their optoelectronic and diode characteristics. MA-, FA-, and GuA-substituted films exhibited low sheet resistance (450-2200 Ohm per sq). However, strain-induced lattice distortions and accumulated defects in GuA-substituted films significantly hindered effective charge collection and increased recombination losses. AVA substitution formed low-conductivity 2D interlayers, dramatically increasing resistance (105 Ohm per sq) and altering transient response characteristics, yet provided minimal reverse-switching losses (100 uW per cm2), beneficial for high-frequency applications. FA substitution emerged as optimal, balancing structural stability, conductivity, minimal defects, and superior diode properties. The obtained results highlight that targeted lattice modifications strongly influence the practical performance of rectifying p-i-n diodes based on CsSnI3. |
| title | Modulation of Charge Transport and Rectification Behavior in CsSnI3 Thin Films Through A-site Cation Engineering |
| topic | Materials Science |
| url | https://arxiv.org/abs/2503.16152 |